High precision micro-scale Hall Effect characterization method using in-line micro four-point probes

Research output: Chapter in Book/Report/Conference proceedingArticle in proceedings – Annual report year: 2008Researchpeer-review

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Accurate characterization of ultra shallow junctions (USJ) is important in order to understand the principles of junction formation and to develop the appropriate implant and annealing technologies. We investigate the capabilities of a new micro-scale Hall effect measurement method where Hall effect is measured with collinear micro four-point probes (M4PP). We derive the sensitivity to electrode position errors and describe a position error suppression method to enable rapid reliable Hall effect measurements with just two measurement points. We show with both Monte Carlo simulations and experimental measurements, that the repeatability of a micro-scale Hall effect measurement is better than 1 %. We demonstrate the ability to spatially resolve Hall effect on micro-scale by characterization of an USJ with a single laser stripe anneal. The micro sheet resistance variations resulting from a spatially inhomogeneous anneal temperature are found to be directly correlated to the degree of dopant activation.
Original languageEnglish
Title of host publicationProceeding of "IEEE"
PublisherIEEE
Publication date2008
Pages251-256
ISBN (Print)978-1-4244-1950-0
DOIs
Publication statusPublished - 2008
Event16th IEEE International Conference on Advanced Thermal Processing of Semiconductors - Las Vegas, NV, United States
Duration: 30 Sep 20083 Oct 2008
Conference number: 16
http://ieeexplore.ieee.org/xpl/mostRecentIssue.jsp?punumber=4660005

Conference

Conference16th IEEE International Conference on Advanced Thermal Processing of Semiconductors
Number16
CountryUnited States
CityLas Vegas, NV
Period30/09/200803/10/2008
Internet address

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