Batch fabrication of nanotubes suspended between microelectrodes

Research output: Contribution to journalJournal article – Annual report year: 2007Researchpeer-review

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We report a fabrication method, which uses standard UV-lithography to pattern the catalyst for the chemical vapour deposition(CVD) of suspended double clamped single walled carbon nanotubes. By using an aqueous solution of Fe(NO3)3 the patterning of the catalyst material onto microelectrodes can be done with a simple lift-off process with standard photolithographic resist. An applied electric field is sustained between the microelectrodes during CVD to guide the nanotube growth. Comparison with simulations shows that the location and the orientation of the grown carbon nanotubes (CNT) correspond to the regions of maximum electric field, enabling accurate positioning of a nanotube by controlling the shape of the microelectrodes. The CNT bridges are deflected tens of nm when a DC voltage is applied between the nanotube and a gate microelectrode indicating that the clamping through the catalyst particles is not only mechanically stable but also electrical conducting. This method could be used to fabricate nanoelectromechanical systems based on suspended double clamped CNTs depending only on photolithography and standard Cleanroom processes.
Original languageEnglish
JournalMicroelectronic Engineering
Volume84
Issue number5-8
Pages (from-to)1431-1435
ISSN0167-9317
DOIs
Publication statusPublished - 2007
Event32nd International Conference on Micro- and Nano- Engineering 2006 - La Caixa, Barcelona, Spain
Duration: 17 Sep 200620 Sep 2006
Conference number: 32
http://www.mne-conf.org/2006/exhibition.php

Conference

Conference32nd International Conference on Micro- and Nano- Engineering 2006
Number32
LocationLa Caixa
CountrySpain
CityBarcelona
Period17/09/200620/09/2006
SponsorLa Caixa
Internet address
CitationsWeb of Science® Times Cited: No match on DOI

    Research areas

  • Single-walled CNTs, Nanotube based NEMS, Nanotube bridges
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