Topas Based Lab-on-a-chip Microsystems Fabricated by Thermal Nanoimprint Lithography

Research output: Contribution to journalConference article – Annual report year: 2005Researchpeer-review

View graph of relations

We, present a one-step technology for fabrication of Topas-based lab-on-a-chip (LOC) microsysterris by the use of thermal nanoimprint lithography (NIL). The technology is demonstrated by the fabrication of two working devices: a particle separator and a LOC with integrated optics for absorbance measurements. These applications demonstrate the fabrication of millimeter to micrometer-sized structures in one lithographic step. The use of NIL makes the technology easily scalable into the nanometer regime by the use of a suitable lithographic technique in the fabrication of the stamp. Processing issues such as environmental stress cracking of the Topas and the requirements to anti-sticking layers on the stamp when imprinting into Topas are discussed.
Original languageEnglish
JournalJournal of Vacuum Science and Technolgy Vol
Volume23
Issue number6
Pages (from-to)2944-2949
ISSN1071-1023
DOIs
Publication statusPublished - 2005
Event49th International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication - Orlando, FL, United States
Duration: 31 May 20053 Jun 2005
Conference number: 49

Conference

Conference49th International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication
Number49
CountryUnited States
CityOrlando, FL
Period31/05/200503/06/2005
CitationsWeb of Science® Times Cited: No match on DOI

ID: 2422183