X-ray reflectivity of a 200 layer W.25Si.75 multilayer crystal

Jens Aage Als-Nielsen, F. Grey

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    Abstract

    X-ray reflectivity studies of a synthetic 200 layer W .25Si.75 crystal on a Si wafer
    with a d-spacing of 25 Å yielded the following results: At a fixed wavelength of 1.54 Å the reflectivity for grazing incidence below a critical angle of 5.1 mrad exceeds 70%. The peak reflectivity of the first order Bragg reflection at the Bragg angle of 31 mrad is 78% of the totally reflected beam, and the relative band width of the peak is 2.1%. Both these numbers are in good agreement with the simplest form of dynamical scattering theory as outlined in the text. The reflectivity of higher harmonics is less than a few per cent, with the fundamental set for reflection at 1.54 Å. Crystals of this quality are very useful optical elements in synchrotron radiation instrumentation, in particular when adequate cooling methods are fully developed.
    Original languageEnglish
    Place of PublicationRoskilde
    PublisherRisø National Laboratory
    Number of pages21
    ISBN (Print)87-550-1605-7
    Publication statusPublished - 1990
    SeriesRisø-M
    Number2846
    ISSN0418-6435

    Keywords

    • Risø-M-2846

    Cite this

    Als-Nielsen, J. A., & Grey, F. (1990). X-ray reflectivity of a 200 layer W.25Si.75 multilayer crystal. Risø National Laboratory. Risø-M, No. 2846