X-ray diffraction investigation of self-annealing in nanocrystalline copper electrodeposits

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    Abstract

    X-ray diffraction analysis and electrical resistivity measurements were conducted simultaneously for in-situ examination of self-annealing in copper electrodeposits. Considerable growth of the as-deposited nano-sized crystallites occurs with time and the crystallographic texture changes by multiple twinning during self-annealing. The kinetics of self-annealing depends on the layer thickness as well as on the orientation and/or the size of the as-deposited crystallites. (c) 2006 Acta Materialia Inc. Published by Elsevier Ltd. All rights reserved.
    Original languageEnglish
    JournalScripta Materialia
    Volume55
    Issue number4
    Pages (from-to)283-286
    ISSN1359-6462
    DOIs
    Publication statusPublished - 2006

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