X-ray diffraction investigation of self-annealing in nanocrystalline copper electrodeposits

Karen Pantleon; Marcel A. J. Somers

doi:10.1016/j.scriptamat.2006.05.010

X-ray diffraction investigation of self-annealing in nanocrystalline copper electrodeposits

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Abstract

X-ray diffraction analysis and electrical resistivity measurements were conducted simultaneously for in-situ examination of self-annealing in copper electrodeposits. Considerable growth of the as-deposited nano-sized crystallites occurs with time and the crystallographic texture changes by multiple twinning during self-annealing. The kinetics of self-annealing depends on the layer thickness as well as on the orientation and/or the size of the as-deposited crystallites. (c) 2006 Acta Materialia Inc. Published by Elsevier Ltd. All rights reserved.

Original language	English
Journal	Scripta Materialia
Volume	55
Issue number	4
Pages (from-to)	283-286
ISSN	1359-6462
DOIs	https://doi.org/10.1016/j.scriptamat.2006.05.010
Publication status	Published - 2006

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10.1016/j.scriptamat.2006.05.010

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title = "X-ray diffraction investigation of self-annealing in nanocrystalline copper electrodeposits",

abstract = "X-ray diffraction analysis and electrical resistivity measurements were conducted simultaneously for in-situ examination of self-annealing in copper electrodeposits. Considerable growth of the as-deposited nano-sized crystallites occurs with time and the crystallographic texture changes by multiple twinning during self-annealing. The kinetics of self-annealing depends on the layer thickness as well as on the orientation and/or the size of the as-deposited crystallites. (c) 2006 Acta Materialia Inc. Published by Elsevier Ltd. All rights reserved. ",

author = "Karen Pantleon and Somers, {Marcel A. J.}",

year = "2006",

doi = "10.1016/j.scriptamat.2006.05.010",

language = "English",

volume = "55",

pages = "283--286",

journal = "Scripta Materialia",

issn = "1359-6462",

publisher = "Pergamon Press",

number = "4",

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T1 - X-ray diffraction investigation of self-annealing in nanocrystalline copper electrodeposits

AU - Pantleon, Karen

AU - Somers, Marcel A. J.

PY - 2006

Y1 - 2006

N2 - X-ray diffraction analysis and electrical resistivity measurements were conducted simultaneously for in-situ examination of self-annealing in copper electrodeposits. Considerable growth of the as-deposited nano-sized crystallites occurs with time and the crystallographic texture changes by multiple twinning during self-annealing. The kinetics of self-annealing depends on the layer thickness as well as on the orientation and/or the size of the as-deposited crystallites. (c) 2006 Acta Materialia Inc. Published by Elsevier Ltd. All rights reserved.

AB - X-ray diffraction analysis and electrical resistivity measurements were conducted simultaneously for in-situ examination of self-annealing in copper electrodeposits. Considerable growth of the as-deposited nano-sized crystallites occurs with time and the crystallographic texture changes by multiple twinning during self-annealing. The kinetics of self-annealing depends on the layer thickness as well as on the orientation and/or the size of the as-deposited crystallites. (c) 2006 Acta Materialia Inc. Published by Elsevier Ltd. All rights reserved.

U2 - 10.1016/j.scriptamat.2006.05.010

DO - 10.1016/j.scriptamat.2006.05.010

M3 - Journal article

VL - 55

SP - 283

EP - 286

JO - Scripta Materialia

JF - Scripta Materialia

SN - 1359-6462

IS - 4

ER -

X-ray diffraction investigation of self-annealing in nanocrystalline copper electrodeposits

Abstract

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