W/SiC X-ray multilayers optimized for use above 100 keV

D.L. Windt, S. Dongey, C.J. Hailey, J. Koglin, V. Honkimaki, E. Ziegler, Finn Erland Christensen, H.C. Chen, F.A. Harrison, W.W. Craig

Research output: Chapter in Book/Report/Conference proceedingArticle in proceedingsResearchpeer-review

Abstract

We have developed a new depth-graded multilayer system comprising W and SiC layers, suitable for use as hard X-ray reflective coatings operating in the energy range 100 - 200 keV. Grazing incidence X-ray reflectance at E=8 keV was used to characterize the interface widths, as well as the temporal and thermal stability in both periodic and depth-graded W/SiC structures, while synchrotron radiation was used to measure the hard X-ray reflectance of a depth-graded multilayer designed specifically for use in the range Esimilar to150 - 170 keV. We have modeled the hard X-ray reflectance using newly-derived optical constants, which we determined from reflectance-vs-incidence angle measurements also made using synchrotron radiation, in the range E=120 - 180 keV. We describe our experimental investigation in detail, compare the new W/SiC multilayers with both W/Si and W/B4C films that have been studied previously, and discuss the significance of these results with regard to the eventual development of a hard X-ray nuclear line telescope.
Original languageEnglish
Title of host publicationSPIE proceedings : X-Ray and Gamma-Ray Telescopes and Instruments for Astronomy
Publication date2002
Pages639-646
ISBN (Print) 0-8194-4630-0
DOIs
Publication statusPublished - 2002
EventSPIE conference: Astronomical Telescopes and Instrumentation 2002 - Waikoloa, United States
Duration: 22 Aug 200228 Aug 2002

Conference

ConferenceSPIE conference: Astronomical Telescopes and Instrumentation 2002
CountryUnited States
CityWaikoloa
Period22/08/200228/08/2002
OtherProc. volume 4851
SeriesProceedings of S P I E - International Society for Optical Engineering
Volume4851
ISSN0277-786X

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