W/SiC x-ray multilayers optimized for use above 100 keV

D.L. Windt, S. Donguy, C.J. Hailey, J. Koglin, V. Honkimaki, E. Ziegler, Finn Erland Christensen, H. Chen, F.A. Harrison, W.W. Craig

Research output: Contribution to journalJournal articleResearchpeer-review


We have developed a new depth-graded multilayer system comprising W and SiC layers, suitable for use as hard x-ray reflective coatings operating in the energy range 100-200 keV. Grazing-incidence x-ray reflectance at E = 8 keV was used to characterize the interface widths, as well as the temporal and thermal stability in both periodic and depth-graded W/SiC structures, whereas synchrotron radiation was used to measure the hard x-ray reflectance of a depth-graded multilayer designed specifically for use in, the range Esimilar to150-170 keV. We have modeled the hard x-ray reflectance using newly derived optical constants, which we determined from reflectance versus incidence angle measurements also made using synchrotron radiation, in the range E = 120-180 keV. We describe our experimental investigation in detail, compare the new W/SiC multilayers with both W/Si and W/B4C films that have been studied previously, and discuss the significance of these results with regard to the eventual development of a hard x-ray nuclear line telescope.
Original languageEnglish
JournalApplied Optics
Issue number13
Pages (from-to)2415-2421
Publication statusPublished - 2003

Fingerprint Dive into the research topics of 'W/SiC x-ray multilayers optimized for use above 100 keV'. Together they form a unique fingerprint.

Cite this