WSe2 as Transparent Top Gate for Infrared Near-Field Microscopy

Niels C.H. Hesp, Mark Kamper Svendsen, Kenji Watanabe, Takashi Taniguchi, Kristian S. Thygesen, Iacopo Torre*, Frank H.L. Koppens

*Corresponding author for this work

Research output: Contribution to journalJournal articleResearchpeer-review

Abstract

Independent control of carrier density and out-of-plane displacement field is essential for accessing novel phenomena in two-dimensional (2D) material heterostructures. While this is achieved with independent top and bottom metallic gate electrodes in transport experiments, it remains a challenge for near-field optical studies as the top electrode interferes with the optical path. Here, we characterize the requirements for a material to be used as the top-gate electrode and demonstrate experimentally that few-layer WSe2 can be used as a transparent, ambipolar top-gate electrode in infrared near-field microscopy. We carry out nanoimaging of plasmons in a bilayer graphene heterostructure tuning the plasmon wavelength using a trilayer WSe2 gate, achieving a density modulation amplitude exceeding 2 × 1012 cm-2. The observed ambipolar gate-voltage response allows us to extract the energy gap of WSe2, yielding a value of 1.05 eV. Our results provide an additional tuning knob to cryogenic near-field experiments on emerging phenomena in 2D materials and moiré heterostructures.

Original languageEnglish
JournalNano Letters
Volume22
Issue number15
Pages (from-to)6200-6206
ISSN1530-6984
DOIs
Publication statusPublished - 2022

Keywords

  • 2D materials
  • Ambipolar
  • Near-field microscopy
  • Top gate
  • Transparent electrode

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