Wavelength tuning of photonic crystal waveguides fabricated using 248-nm deep UV lithography

Yanxin Zhuang; Lars Hagedorn Frandsen; Anders Harpøth; Morten Thorhauge; Martin Kristensen; Peter Ingo Borel; W. Bogaerts; R. Baets

doi:10.1109/OFC.2004.1362143

Wavelength tuning of photonic crystal waveguides fabricated using 248-nm deep UV lithography

Yanxin Zhuang
, Lars Hagedorn Frandsen
, Anders Harpøth
, Morten Thorhauge
, Martin Kristensen
, Peter Ingo Borel
, W. Bogaerts
, R. Baets

Research output: Chapter in Book/Report/Conference proceeding › Article in proceedings › Research › peer-review

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Abstract

Wavelength tuning of characteristic features of straight photonic crystal waveguides has been obtained by varying the exposure dose in deep UV lithography. The experimental results agree very well with numerical simulations.

Original language	English
Title of host publication	Optical Fiber Communication Conference, 2004. OFC 2004
Volume	2
Publisher	IEEE
Publication date	2004
ISBN (Print)	1-55752-772-5
DOIs	https://doi.org/10.1109/OFC.2004.1362143
Publication status	Published - 2004
Event	2004 Optical Fiber Communication Conference and Exhibition - Los Angeles, CA, United States Duration: 23 Feb 2004 → 27 Feb 2004

Conference

Conference	2004 Optical Fiber Communication Conference and Exhibition
Country/Territory	United States
City	Los Angeles, CA
Period	23/02/2004 → 27/02/2004

Bibliographical note

Copyright: 2004 IEEE. Personal use of this material is permitted. However, permission to reprint/republish this material for advertising or promotional purposes or for creating new collective works for resale or redistribution to servers or lists, or to reuse any copyrighted component of this work in other works must be obtained from the IEEE

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@inproceedings{94bcb8a665b24e0e8a18ae555b0d1bed,

title = "Wavelength tuning of photonic crystal waveguides fabricated using 248-nm deep UV lithography",

abstract = "Wavelength tuning of characteristic features of straight photonic crystal waveguides has been obtained by varying the exposure dose in deep UV lithography. The experimental results agree very well with numerical simulations.",

author = "Yanxin Zhuang and Frandsen, \{Lars Hagedorn\} and Anders Harp{\o}th and Morten Thorhauge and Martin Kristensen and Borel, \{Peter Ingo\} and W. Bogaerts and R. Baets",

note = "Copyright: 2004 IEEE. Personal use of this material is permitted. However, permission to reprint/republish this material for advertising or promotional purposes or for creating new collective works for resale or redistribution to servers or lists, or to reuse any copyrighted component of this work in other works must be obtained from the IEEE; 2004 Optical Fiber Communication Conference and Exhibition, OFC2004 ; Conference date: 23-02-2004 Through 27-02-2004",

year = "2004",

doi = "10.1109/OFC.2004.1362143",

language = "English",

isbn = "1-55752-772-5",

volume = "2",

booktitle = "Optical Fiber Communication Conference, 2004. OFC 2004",

publisher = "IEEE",

address = "United States",

}

Zhuang, Y, Frandsen, LH, Harpøth, A, Thorhauge, M, Kristensen, M, Borel, PI, Bogaerts, W & Baets, R 2004, Wavelength tuning of photonic crystal waveguides fabricated using 248-nm deep UV lithography. in Optical Fiber Communication Conference, 2004. OFC 2004. vol. 2, IEEE, 2004 Optical Fiber Communication Conference and Exhibition, Los Angeles, CA, United States, 23/02/2004. https://doi.org/10.1109/OFC.2004.1362143

TY - GEN

T1 - Wavelength tuning of photonic crystal waveguides fabricated using 248-nm deep UV lithography

AU - Zhuang, Yanxin

AU - Frandsen, Lars Hagedorn

AU - Harpøth, Anders

AU - Thorhauge, Morten

AU - Kristensen, Martin

AU - Borel, Peter Ingo

AU - Bogaerts, W.

AU - Baets, R.

N1 - Copyright: 2004 IEEE. Personal use of this material is permitted. However, permission to reprint/republish this material for advertising or promotional purposes or for creating new collective works for resale or redistribution to servers or lists, or to reuse any copyrighted component of this work in other works must be obtained from the IEEE

PY - 2004

Y1 - 2004

N2 - Wavelength tuning of characteristic features of straight photonic crystal waveguides has been obtained by varying the exposure dose in deep UV lithography. The experimental results agree very well with numerical simulations.

AB - Wavelength tuning of characteristic features of straight photonic crystal waveguides has been obtained by varying the exposure dose in deep UV lithography. The experimental results agree very well with numerical simulations.

U2 - 10.1109/OFC.2004.1362143

DO - 10.1109/OFC.2004.1362143

M3 - Article in proceedings

SN - 1-55752-772-5

VL - 2

BT - Optical Fiber Communication Conference, 2004. OFC 2004

PB - IEEE

T2 - 2004 Optical Fiber Communication Conference and Exhibition

Y2 - 23 February 2004 through 27 February 2004

ER -

Wavelength tuning of photonic crystal waveguides fabricated using 248-nm deep UV lithography

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