Wavelength tuning of photonic crystal waveguides fabricated using 248-nm deep UV lithography

Yanxin Zhuang, Lars Hagedorn Frandsen, Anders Harpøth, Morten Thorhauge, Martin Kristensen, Peter Ingo Borel, W. Bogaerts, R. Baets

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Abstract

Wavelength tuning of characteristic features of straight photonic crystal waveguides has been obtained by varying the exposure dose in deep UV lithography. The experimental results agree very well with numerical simulations.
Original languageEnglish
Title of host publicationOptical Fiber Communication Conference, 2004. OFC 2004
Volume2
PublisherIEEE
Publication date2004
ISBN (Print)1-55752-772-5
DOIs
Publication statusPublished - 2004
Event2004 Optical Fiber Communication Conference and Exhibition - Los Angeles, CA, United States
Duration: 23 Feb 200427 Feb 2004

Conference

Conference2004 Optical Fiber Communication Conference and Exhibition
CountryUnited States
CityLos Angeles, CA
Period23/02/200427/02/2004

Bibliographical note

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