Wafer scale integration of catalyst dots into nonplanar microsystems

Kjetil Gjerde, Jakob Kjelstrup-Hansen, Lauge Gammelgaard, Peter Bøggild

    Research output: Contribution to journalJournal articleResearchpeer-review

    Abstract

    In order to successfully integrate bottom-up fabricated nanostructures such as carbon nanotubes or silicon, germanium, or III-V nanowires into microelectromechanical systems on a wafer scale, reliable ways of integrating catalyst dots are needed. Here, four methods for integrating sub-100-nm diameter nickel catalyst dots on a wafer scale are presented and compared. Three of the methods are based on a p-Si layer utilized as an in situ mask, an encapsulating layer, and a sacrificial window mask, respectively. All methods enable precise positioning of nickel catalyst dots at the end of a microcantilever, while avoiding contamination of the used cleanroom process equipment. The methods are suitable for fabrication of scanning probe tips and nanoelectrodes for advanced characterization probes.
    Original languageEnglish
    JournalJournal of Micro-nanolithography Mems and Moems
    Volume6
    Issue number4
    ISSN1537-1646
    DOIs
    Publication statusPublished - 2007

    Keywords

    • nonplanar microsystems
    • scanning probe tips
    • microcantilever
    • nanolithography
    • catalyst dots

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