Wafer scale coating of polymer cantilever fabricated by nanoimprint lithography

Anders Greve, Søren Dohn, Stephan Urs Keller, Asger Laurberg Vig, Anders Kristensen, Claus Højgård Nielsen, Niels Bent Larsen, Anja Boisen

    Research output: Chapter in Book/Report/Conference proceedingArticle in proceedingsResearchpeer-review

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    Abstract

    Microcantilevers can be fabricated in TOPAS by nanoimprint lithography, with the dimensions of 500 ¿m length 4.5 ¿m thickness and 100 ¿m width. By using a plasma polymerization technique it is possible to selectively functionalize individually cantilevers with a polymer coating, on wafer scale by using a shadow masking technique.
    Original languageEnglish
    Title of host publication2010 IEEE 23rd International Conference on Micro Electro Mechanical Systems (MEMS)
    PublisherIEEE
    Publication date2010
    Pages612-614
    ISBN (Print)978-1-4244-5761-8
    ISBN (Electronic)978-1-4244-5763-2
    DOIs
    Publication statusPublished - 2010
    Event2010 IEEE 23rd International Conference on Micro Electro Mechanical Systems (MEMS) - Wanchai, Hong Kong
    Duration: 24 Jan 201028 Jan 2010

    Conference

    Conference2010 IEEE 23rd International Conference on Micro Electro Mechanical Systems (MEMS)
    CountryHong Kong
    CityWanchai
    Period24/01/201028/01/2010

    Bibliographical note

    Copyright 2010 IEEE. Personal use of this material is permitted. However, permission to reprint/republish this material for advertising or promotional purposes or for creating new collective works for resale or redistribution to servers or lists, or to reuse any copyrighted component of this work in other works must be obtained from the IEEE.

    Cite this

    Greve, A., Dohn, S., Keller, S. U., Vig, A. L., Kristensen, A., Nielsen, C. H., ... Boisen, A. (2010). Wafer scale coating of polymer cantilever fabricated by nanoimprint lithography. In 2010 IEEE 23rd International Conference on Micro Electro Mechanical Systems (MEMS) (pp. 612-614). IEEE. https://doi.org/10.1109/MEMSYS.2010.5442334
    Greve, Anders ; Dohn, Søren ; Keller, Stephan Urs ; Vig, Asger Laurberg ; Kristensen, Anders ; Nielsen, Claus Højgård ; Larsen, Niels Bent ; Boisen, Anja. / Wafer scale coating of polymer cantilever fabricated by nanoimprint lithography. 2010 IEEE 23rd International Conference on Micro Electro Mechanical Systems (MEMS). IEEE, 2010. pp. 612-614
    @inproceedings{51beb09d8f9f4d69a1205d1158827200,
    title = "Wafer scale coating of polymer cantilever fabricated by nanoimprint lithography",
    abstract = "Microcantilevers can be fabricated in TOPAS by nanoimprint lithography, with the dimensions of 500 {\^A}¿m length 4.5 {\^A}¿m thickness and 100 {\^A}¿m width. By using a plasma polymerization technique it is possible to selectively functionalize individually cantilevers with a polymer coating, on wafer scale by using a shadow masking technique.",
    author = "Anders Greve and S{\o}ren Dohn and Keller, {Stephan Urs} and Vig, {Asger Laurberg} and Anders Kristensen and Nielsen, {Claus H{\o}jg{\aa}rd} and Larsen, {Niels Bent} and Anja Boisen",
    note = "Copyright 2010 IEEE. Personal use of this material is permitted. However, permission to reprint/republish this material for advertising or promotional purposes or for creating new collective works for resale or redistribution to servers or lists, or to reuse any copyrighted component of this work in other works must be obtained from the IEEE.",
    year = "2010",
    doi = "10.1109/MEMSYS.2010.5442334",
    language = "English",
    isbn = "978-1-4244-5761-8",
    pages = "612--614",
    booktitle = "2010 IEEE 23rd International Conference on Micro Electro Mechanical Systems (MEMS)",
    publisher = "IEEE",
    address = "United States",

    }

    Greve, A, Dohn, S, Keller, SU, Vig, AL, Kristensen, A, Nielsen, CH, Larsen, NB & Boisen, A 2010, Wafer scale coating of polymer cantilever fabricated by nanoimprint lithography. in 2010 IEEE 23rd International Conference on Micro Electro Mechanical Systems (MEMS). IEEE, pp. 612-614, 2010 IEEE 23rd International Conference on Micro Electro Mechanical Systems (MEMS), Wanchai, Hong Kong, 24/01/2010. https://doi.org/10.1109/MEMSYS.2010.5442334

    Wafer scale coating of polymer cantilever fabricated by nanoimprint lithography. / Greve, Anders; Dohn, Søren; Keller, Stephan Urs; Vig, Asger Laurberg; Kristensen, Anders; Nielsen, Claus Højgård; Larsen, Niels Bent; Boisen, Anja.

    2010 IEEE 23rd International Conference on Micro Electro Mechanical Systems (MEMS). IEEE, 2010. p. 612-614.

    Research output: Chapter in Book/Report/Conference proceedingArticle in proceedingsResearchpeer-review

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    AU - Vig, Asger Laurberg

    AU - Kristensen, Anders

    AU - Nielsen, Claus Højgård

    AU - Larsen, Niels Bent

    AU - Boisen, Anja

    N1 - Copyright 2010 IEEE. Personal use of this material is permitted. However, permission to reprint/republish this material for advertising or promotional purposes or for creating new collective works for resale or redistribution to servers or lists, or to reuse any copyrighted component of this work in other works must be obtained from the IEEE.

    PY - 2010

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    N2 - Microcantilevers can be fabricated in TOPAS by nanoimprint lithography, with the dimensions of 500 ¿m length 4.5 ¿m thickness and 100 ¿m width. By using a plasma polymerization technique it is possible to selectively functionalize individually cantilevers with a polymer coating, on wafer scale by using a shadow masking technique.

    AB - Microcantilevers can be fabricated in TOPAS by nanoimprint lithography, with the dimensions of 500 ¿m length 4.5 ¿m thickness and 100 ¿m width. By using a plasma polymerization technique it is possible to selectively functionalize individually cantilevers with a polymer coating, on wafer scale by using a shadow masking technique.

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    DO - 10.1109/MEMSYS.2010.5442334

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    EP - 614

    BT - 2010 IEEE 23rd International Conference on Micro Electro Mechanical Systems (MEMS)

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    Greve A, Dohn S, Keller SU, Vig AL, Kristensen A, Nielsen CH et al. Wafer scale coating of polymer cantilever fabricated by nanoimprint lithography. In 2010 IEEE 23rd International Conference on Micro Electro Mechanical Systems (MEMS). IEEE. 2010. p. 612-614 https://doi.org/10.1109/MEMSYS.2010.5442334