Abstract
Propagation of channel plasmon-polariton modes in the bottom of a metal V groove has been recently demonstrated. It provides a unique way of manipulating light at nanometer length scale. In this work, we present a method based on nanoimprint lithography that allows parallel fabrication of integrated optical devices composed of metal V grooves. This method represents an improvement with respect to previous works, where the V grooves were fabricated by direct milling of the metal, in terms of robustness and throughput.
© 2007 American Vacuum Society
© 2007 American Vacuum Society
Original language | English |
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Journal | Journal of Vacuum Science and Technology. Part B. Microelectronics and Nanometer Structures |
Volume | 25 |
Issue number | 6 |
Pages (from-to) | 2649-2653 |
ISSN | 1071-1023 |
DOIs | |
Publication status | Published - 2007 |