Understanding of increased diffuse scattering in regular arrays of fluctuating resonant particles

Andrei Andryieuski, Mihail Petrov, Andrei Lavrinenko, Sergei A. Tretyakov

    Research output: Chapter in Book/Report/Conference proceedingArticle in proceedingsResearchpeer-review

    Abstract

    In this presentation we will discuss the analytical and numerical approaches to modeling electromagnetic properties of geometrically regular subwavelength 2D arrays of random resonant plasmonic particles. Amorphous metamaterials and metasurfaces attract interest of the scientific community due to promising technological implementations with cost-efficient methods of large-scale chemical nanoparticles synthesis as well as their self-organization. Random fluctuations of the particles size, shape, and/or composition are inevitable not only in the bottom-up synthesis, but also in conventional electron beam and photolithography fabrication. Despite the significant progress in large-scale fabrication, modeling and effective properties prediction of random/amorphous metamaterials and metasurfaces is still a challenge, which we address here. We present our results on analytical modelling of metasurfaces with regular periodic arrangements of resonant nanoparticles of random polarizability/size/material at normal plane-wave incidence. We show that randomness of the polarizability is related to increase in diffused scattering and we relate this phenomenon to a modification of the dipoles’ interaction constant. As a result, we obtain a simple analytical formula which describes diffuse scattering in such amorphous metasurfaces. Employing the supercell approach we numerically confirm the analytical results. The proposed approach can be easily extended from electrical dipole arrays and normal wave incidence to more general cases of electric and magnetic resonant particles and oblique incidence.
    Original languageEnglish
    Title of host publicationProceedings of Spie
    Volume9544
    PublisherSPIE - International Society for Optical Engineering
    Publication date2015
    Article number95441X
    ISBN (Print)9781628417104
    DOIs
    Publication statusPublished - 2015
    EventMetamaterials, Metadevices and Metasystems 2015 - San Diego, United States
    Duration: 9 Aug 201613 Aug 2016

    Conference

    ConferenceMetamaterials, Metadevices and Metasystems 2015
    Country/TerritoryUnited States
    CitySan Diego
    Period09/08/201613/08/2016
    SeriesProceedings of SPIE - The International Society for Optical Engineering
    ISSN0277-786X

    Keywords

    • NANOSCIENCE
    • MATERIALS
    • OPTICS
    • Nanophotonic devices and technology
    • Optical metamaterials
    • Structure of amorphous, disordered and polymeric materials
    • Fine-particle magnetic systems
    • Nanolithography
    • Optical materials
    • Magnetic materials
    • amorphous state
    • electron beam lithography
    • fluctuations
    • light scattering
    • magnetic particles
    • nanolithography
    • nanoparticles
    • nanophotonics
    • optical metamaterials
    • particle size
    • photolithography
    • plasmonics
    • polarisability
    • random processes
    • diffuse scattering
    • fluctuating resonant particles
    • electromagnetic properties
    • geometrically regular subwavelength 2D arrays
    • random resonant plasmonic particles
    • amorphous metamaterials
    • large-scale chemical nanoparticle synthesis
    • self-organization
    • random fluctuations
    • particle shape
    • particle composition
    • bottom-up synthesis
    • conventional electron beam lithography
    • photolithography fabrication
    • large-scale fabrication
    • random metamaterials
    • amorphous metasurfaces
    • analytical modelling
    • resonant nanoparticles
    • random polarizability
    • random size
    • normal plane-wave incidence
    • dipole interaction constant
    • electrical dipole arrays
    • normal wave incidence
    • electric resonant particles
    • magnetic resonant particles
    • oblique incidence

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