Ultrathin VOx/TiO2(110) (x approximate to 1) film preparation by controlled oxidation of metal deposits

Michela Della Negra; Mauro Sambi; Gaetano Granozzi

doi:10.1016/S0039-6028(99)00666-4

Ultrathin VOx/TiO2(110) (x approximate to 1) film preparation by controlled oxidation of metal deposits

Michela Della Negra, Mauro Sambi, Gaetano Granozzi

Research output: Contribution to journal › Journal article › Research › peer-review

Abstract

Metallic vanadium ultrathin films deposited on the TiO2 (110) surface are easily oxidised to VO2 when they react with O2 in the high vacuum pressure range. We have found that the oxidation can be stopped at VOx (x#1) when annealing of the metal film is carried out in UHV, by exploiting the reaction with bulk-to-surface diffusing oxygen. By adopting carefully optimised experimental conditions (e.g. metal film thickness and annealing temperature), locally ordered VOx films with a thickness of up to 5 ML can be prepared. X-ray photoelectron spectroscopy and anglescanned photoelectron diffraction, as an in situ structural characterisation tool, have proven to be extremely useful in order to find optimised conditions for the whole process. © 1999 Elsevier Science B.V. All rights reserved.
Keyword: Titanium oxide,Photoelectron diffraction,X-ray photoelectron spectroscopy,Vanadium oxide,Epitaxy

Original language	English
Journal	Surface Science
Volume	436
Pages (from-to)	227-236
ISSN	0039-6028
DOIs	https://doi.org/10.1016/S0039-6028(99)00666-4
Publication status	Published - 1999
Externally published	Yes

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@article{3e2409f1b900475489199e2d5e38f629,

title = "Ultrathin VOx/TiO2(110) (x approximate to 1) film preparation by controlled oxidation of metal deposits",

abstract = "Metallic vanadium ultrathin films deposited on the TiO2 (110) surface are easily oxidised to VO2 when they react with O2 in the high vacuum pressure range. We have found that the oxidation can be stopped at VOx (x#1) when annealing of the metal film is carried out in UHV, by exploiting the reaction with bulk-to-surface diffusing oxygen. By adopting carefully optimised experimental conditions (e.g. metal film thickness and annealing temperature), locally ordered VOx films with a thickness of up to 5 ML can be prepared. X-ray photoelectron spectroscopy and anglescanned photoelectron diffraction, as an in situ structural characterisation tool, have proven to be extremely useful in order to find optimised conditions for the whole process. {\textcopyright} 1999 Elsevier Science B.V. All rights reserved. Keyword: Titanium oxide,Photoelectron diffraction,X-ray photoelectron spectroscopy,Vanadium oxide,Epitaxy",

author = "{Della Negra}, Michela and Mauro Sambi and Gaetano Granozzi",

year = "1999",

doi = "10.1016/S0039-6028(99)00666-4",

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TY - JOUR

T1 - Ultrathin VOx/TiO2(110) (x approximate to 1) film preparation by controlled oxidation of metal deposits

AU - Della Negra, Michela

AU - Sambi, Mauro

AU - Granozzi, Gaetano

PY - 1999

Y1 - 1999

N2 - Metallic vanadium ultrathin films deposited on the TiO2 (110) surface are easily oxidised to VO2 when they react with O2 in the high vacuum pressure range. We have found that the oxidation can be stopped at VOx (x#1) when annealing of the metal film is carried out in UHV, by exploiting the reaction with bulk-to-surface diffusing oxygen. By adopting carefully optimised experimental conditions (e.g. metal film thickness and annealing temperature), locally ordered VOx films with a thickness of up to 5 ML can be prepared. X-ray photoelectron spectroscopy and anglescanned photoelectron diffraction, as an in situ structural characterisation tool, have proven to be extremely useful in order to find optimised conditions for the whole process. © 1999 Elsevier Science B.V. All rights reserved. Keyword: Titanium oxide,Photoelectron diffraction,X-ray photoelectron spectroscopy,Vanadium oxide,Epitaxy

AB - Metallic vanadium ultrathin films deposited on the TiO2 (110) surface are easily oxidised to VO2 when they react with O2 in the high vacuum pressure range. We have found that the oxidation can be stopped at VOx (x#1) when annealing of the metal film is carried out in UHV, by exploiting the reaction with bulk-to-surface diffusing oxygen. By adopting carefully optimised experimental conditions (e.g. metal film thickness and annealing temperature), locally ordered VOx films with a thickness of up to 5 ML can be prepared. X-ray photoelectron spectroscopy and anglescanned photoelectron diffraction, as an in situ structural characterisation tool, have proven to be extremely useful in order to find optimised conditions for the whole process. © 1999 Elsevier Science B.V. All rights reserved. Keyword: Titanium oxide,Photoelectron diffraction,X-ray photoelectron spectroscopy,Vanadium oxide,Epitaxy

U2 - 10.1016/S0039-6028(99)00666-4

DO - 10.1016/S0039-6028(99)00666-4

M3 - Journal article

SN - 0039-6028

VL - 436

SP - 227

EP - 236

JO - Surface Science

JF - Surface Science

ER -

Ultrathin VOx/TiO2(110) (x approximate to 1) film preparation by controlled oxidation of metal deposits

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