Abstract
Thin-film photovoltaics offers the potential for a significant cost reduction compared
to traditional photovoltaics. However, the performance of thin-film solar cells is limited by poor
light absorption. We have devised an ultra-thin-film silicon solar cell configuration assisted by
plasmonic nanostructures. By placing a one-dimensional plasmonic nanograting on the bottom
of the solar cell, the generated photocurrent for a 200 nm-thickness crystalline silicon solar cell
can be enhanced by 90% in the considered wavelength range, while keeping insensitive to the
incident angle. These results are paving a promising way for the realization of high-efficiency
thin-film solar cells.
to traditional photovoltaics. However, the performance of thin-film solar cells is limited by poor
light absorption. We have devised an ultra-thin-film silicon solar cell configuration assisted by
plasmonic nanostructures. By placing a one-dimensional plasmonic nanograting on the bottom
of the solar cell, the generated photocurrent for a 200 nm-thickness crystalline silicon solar cell
can be enhanced by 90% in the considered wavelength range, while keeping insensitive to the
incident angle. These results are paving a promising way for the realization of high-efficiency
thin-film solar cells.
| Original language | English |
|---|---|
| Article number | 061503 |
| Journal | Journal of Nanophotonics |
| Volume | 6 |
| Issue number | 1 |
| Number of pages | 9 |
| ISSN | 1934-2608 |
| DOIs | |
| Publication status | Published - 2012 |
Bibliographical note
Copyright 2012 Society of Photo-Optical Instrumentation Engineers. One print or electronic copy may be made for personal use only. Systematic reproduction and distribution, duplication of any material in this paper for a fee or for commercial purposes, or modification of the content of the paper are prohibited.Keywords
- Solar cells
- Plasmonics
- Absorption enhancement
- Grating
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