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Ultrahigh aspect ratio etching of silicon in SF6-O2 plasma: The clear-oxidize-remove-etch (CORE) sequence and chromium mask
Vy Thi Hoang Nguyen, Evgeniy Shkondin, Flemming Jensen, Jörg Hübner, Pele Leussink, Henri Jansen*
*Corresponding author for this work
Research output: Contribution to journal › Journal article › Research › peer-review
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