Ultra-thin Metal and Dielectric Layers for Nanophotonic Applications

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Abstract

In our talk we first give an overview of the various thin films used in the field of nanophotonics. Then we describe our own activity in fabrication and characterization of ultra-thin films of high quality. We particularly focus on uniform gold layers having thicknesses down to 6 nm fabricated by e-beam deposition on dielectric substrates and Al-oxides/Ti-oxides multilayers prepared by atomic layer deposition in high aspect ratio trenches. In the latter case we show more than 1:20 aspect ratio structures can be achieved.
Original languageEnglish
Title of host publicationProceedings of ICTON 2015
Number of pages4
PublisherIEEE
Publication date2015
Article number7193380
ISBN (Print)978-1-4673-7880-2
DOIs
Publication statusPublished - 2015
Event17th International Conference on Transparent Optical Networks - Danubius Thermal Hotel Helia, Budapest, Hungary
Duration: 5 Jun 20159 Jul 2015

Conference

Conference17th International Conference on Transparent Optical Networks
LocationDanubius Thermal Hotel Helia
Country/TerritoryHungary
CityBudapest
Period05/06/201509/07/2015

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