Ultra-thin Metal and Dielectric Layers for Nanophotonic Applications

Evgeniy Shkondin; Lorenzo Leandro; Radu Malureanu; Flemming Jensen; Noemi Rozlosnik; Andrei Lavrinenko

doi:10.1109/icton.2015.7193380

Ultra-thin Metal and Dielectric Layers for Nanophotonic Applications

Evgeniy Shkondin, Lorenzo Leandro, Radu Malureanu, Flemming Jensen, Noemi Rozlosnik, Andrei Lavrinenko

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Abstract

In our talk we first give an overview of the various thin films used in the field of nanophotonics. Then we describe our own activity in fabrication and characterization of ultra-thin films of high quality. We particularly focus on uniform gold layers having thicknesses down to 6 nm fabricated by e-beam deposition on dielectric substrates and Al-oxides/Ti-oxides multilayers prepared by atomic layer deposition in high aspect ratio trenches. In the latter case we show more than 1:20 aspect ratio structures can be achieved.

Original language	English
Title of host publication	Proceedings of ICTON 2015
Number of pages	4
Publisher	IEEE
Publication date	2015
Article number	7193380
ISBN (Print)	978-1-4673-7880-2
DOIs	https://doi.org/10.1109/icton.2015.7193380
Publication status	Published - 2015
Event	17th International Conference on Transparent Optical Networks - Danubius Thermal Hotel Helia, Budapest, Hungary Duration: 5 Jul 2015 → 9 Jul 2015 Conference number: 17

Conference

Conference	17th International Conference on Transparent Optical Networks
Number	17
Location	Danubius Thermal Hotel Helia
Country/Territory	Hungary
City	Budapest
Period	05/07/2015 → 09/07/2015

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title = "Ultra-thin Metal and Dielectric Layers for Nanophotonic Applications",

abstract = "In our talk we first give an overview of the various thin films used in the field of nanophotonics. Then we describe our own activity in fabrication and characterization of ultra-thin films of high quality. We particularly focus on uniform gold layers having thicknesses down to 6 nm fabricated by e-beam deposition on dielectric substrates and Al-oxides/Ti-oxides multilayers prepared by atomic layer deposition in high aspect ratio trenches. In the latter case we show more than 1:20 aspect ratio structures can be achieved.",

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AU - Shkondin, Evgeniy

AU - Leandro, Lorenzo

AU - Malureanu, Radu

AU - Jensen, Flemming

AU - Rozlosnik, Noemi

AU - Lavrinenko, Andrei

N1 - Conference code: 17

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AB - In our talk we first give an overview of the various thin films used in the field of nanophotonics. Then we describe our own activity in fabrication and characterization of ultra-thin films of high quality. We particularly focus on uniform gold layers having thicknesses down to 6 nm fabricated by e-beam deposition on dielectric substrates and Al-oxides/Ti-oxides multilayers prepared by atomic layer deposition in high aspect ratio trenches. In the latter case we show more than 1:20 aspect ratio structures can be achieved.

U2 - 10.1109/icton.2015.7193380

DO - 10.1109/icton.2015.7193380

M3 - Article in proceedings

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PB - IEEE

T2 - 17th International Conference on Transparent Optical Networks

Y2 - 5 July 2015 through 9 July 2015

ER -

Ultra-thin Metal and Dielectric Layers for Nanophotonic Applications

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