Ultra-thin films for plasmonics: a technology overview

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Abstract

Ultra-thin films with low surface roughness that support surface plasmon-polaritons in the infra-red and visible ranges are needed in order to improve the performance of devices based on the manipulation of plasmon propagation. Increasing amount of efforts is made in order not only to improve the quality of the deposited layers but also to diminish their thickness and to find new materials that could be used in this field. In this review, we consider various thin films used in the field of plasmonics and metamaterials in the visible and IR range. We focus our presentation on technological issues of their deposition and reported characterization of film plasmonic performance.
Original languageEnglish
JournalNanotechnology Reviews
Volume4
Issue number3
Pages (from-to)259-275
ISSN2191-9089
DOIs
Publication statusPublished - 2015

Keywords

  • CHEMISTRY,
  • NANOSCIENCE
  • MATERIALS
  • PHYSICS,
  • CHEMICAL-VAPOR-DEPOSITION
  • X-RAY REFLECTIVITY
  • TRANSPARENT CONDUCTING OXIDE
  • ATOMIC-LAYER DEPOSITION
  • ORGANIC SOLAR-CELLS
  • GOLD-FILMS
  • SILVER FILMS
  • GRAPHENE PLASMONICS
  • OPTICAL-PROPERTIES
  • SUBSTRATE-TEMPERATURE
  • plasmonics
  • ultra-thin films
  • VIS/I range
  • Plasmonics
  • Ultra-thin films
  • VIS/IR range
  • Electromagnetic wave polarization
  • Surface roughness
  • Thin films
  • Ultrathin films
  • Deposited layer
  • Low surface roughness
  • Performance of devices
  • Plasmon propagation
  • Support surfaces
  • Visible range
  • Plasmons

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