Tuning the Ground State of Oxide Interfaces by an Electron Sink

Y. L. Gan, M. von Soosten, Y. Zhang, D. Krishnan, Z. Zhong, W. Niu, D. J. Carrad, K. Norrman, D. V. Christensen, N. Gauquelin, T. S. Jespersen, B.G. Shen, J. Verbeeck, J. R. Sun, N. Pryds, Y. Z. Chen

Research output: Contribution to conferenceConference abstract for conferenceResearchpeer-review

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Original languageEnglish
Publication date2018
Number of pages1
Publication statusPublished - 2018
Event25th International Workshop on Oxide Electronics (2018) - the Congress-Center at Les Diablerets, Les Diablerets, Switzerland
Duration: 1 Oct 20183 Oct 2018


Workshop25th International Workshop on Oxide Electronics (2018)
Locationthe Congress-Center at Les Diablerets
CityLes Diablerets
Internet address

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