@article{6dda55f1580b46c99e8e535c0681c04a,
title = "Trenches for building blocks of advanced planar components",
abstract = "Trenches are fundamental structures used to build advanced optical planar waveguide components. In this letter, the fabrication of trenches across silica-on-silicon waveguides using inductively coupled plasma etching is presented. These trenches were etched deep into the silicon substrate and their widths were varied between 24 and 100>tex/textex/tex",
author = "Ou Haiyan",
note = "Copyright: 2004 IEEE. Personal use of this material is permitted. However, permission to reprint/republish this material for advertising or promotional purposes or for creating new collective works for resale or redistribution to servers or lists, or to reuse any copyrighted component of this work in other works must be obtained from the IEEE",
year = "2004",
doi = "10.1109/LPT.2004.826052",
language = "English",
volume = "16",
pages = "1334--1336",
journal = "I E E E Photonics Technology Letters",
issn = "1041-1135",
publisher = "Institute of Electrical and Electronics Engineers",
number = "5",
}