Towards easily reproducible nano-structured SERS substrates

Michael Stenbæk Schmidt, Anja Boisen, Jörg Hübner

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    Abstract

    In this paper we present a quick and easy method for producing relatively large areas of substrate that enhance the Raman effect, using standard semiconductor processing techniques such as reactive ion etching of silicon and electron beam metal deposition. As standard cleanroom processes are used, it is possible to narrowly control the parameters of the fabrication process to create silicon nano-pillars with controlled heights and spacing. The silicon nano-pillars are coated by thin films of silver and/or gold to create surfaces that greatly enhance the Raman effect. Surface enhanced Raman scattering (SERS) has numerous applications in chemical sensing, with high sensitivity and fast analysis speed seen as the main advantages, and these novel substrates are believed to be able to make SERS more applicable.
    Original languageEnglish
    Title of host publicationSensors, 2009 IEEE
    PublisherIEEE
    Publication date2009
    Pages1763-1767
    ISBN (Print)978-1-4244-4548-6
    DOIs
    Publication statusPublished - 2009
    Event8th IEEE Conference on Sensors - Christchurch, New Zealand
    Duration: 25 Oct 200928 Oct 2009

    Conference

    Conference8th IEEE Conference on Sensors
    CountryNew Zealand
    CityChristchurch
    Period25/10/200928/10/2009

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