Topology optimization for optical projection lithography with manufacturing uncertainties

Mingdong Zhou, Boyan Stefanov Lazarov, Ole Sigmund

Research output: Contribution to journalJournal articleResearchpeer-review

Abstract

This article presents a topology optimization approach for micro-and nano-devices fabricated by optical projection lithography. Incorporating the photolithography process and the manufacturing uncertainties into the topology optimization process results in a binary mask that can be sent directly to manufacturing without additional optical proximity correction (OPC). The performance of the optimized device is robust toward the considered process variations. With the proposed unified approach, the design for photolithography is achieved by considering the optimal device performance and manufacturability at the same time. Only one optimization problem is solved instead of two as in the conventional separate procedures by (1) blueprint design and (2) OPC. A micro-gripper design example is presented to demonstrate the potential of this approach. (C) 2014 Optical Society of America
Original languageEnglish
JournalApplied Optics
Volume53
Issue number12
Pages (from-to)2720-2729
ISSN1559-128X
DOIs
Publication statusPublished - 2014

Keywords

  • OPTICS
  • PHASE-SHIFTING MASK
  • INVERSE LITHOGRAPHY
  • DESIGN
  • MICROLITHOGRAPHY
  • RESOLUTION
  • OPC

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