Topas Based Lab-on-a-chip Microsystems Fabricated by Thermal Nanoimprint Lithography

Research output: Contribution to journalConference article – Annual report year: 2005Researchpeer-review

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Topas Based Lab-on-a-chip Microsystems Fabricated by Thermal Nanoimprint Lithography. / Olsen, Brian Bilenberg; Hansen, Michael Søren; Özkapici, V.; Jeppesen, C.; Johansen, Dan Mario; Szabo, Peter; Obieta, I. M.; Arroyo, O.; Tegendfeldt, J. O.; Kristensen, Anders.

In: Journal of Vacuum Science and Technolgy Vol, Vol. 23, No. 6, 2005, p. 2944-2949.

Research output: Contribution to journalConference article – Annual report year: 2005Researchpeer-review

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@inproceedings{1699733fd2e540a0a591217580fb22b9,
title = "Topas Based Lab-on-a-chip Microsystems Fabricated by Thermal Nanoimprint Lithography",
abstract = "We, present a one-step technology for fabrication of Topas-based lab-on-a-chip (LOC) microsysterris by the use of thermal nanoimprint lithography (NIL). The technology is demonstrated by the fabrication of two working devices: a particle separator and a LOC with integrated optics for absorbance measurements. These applications demonstrate the fabrication of millimeter to micrometer-sized structures in one lithographic step. The use of NIL makes the technology easily scalable into the nanometer regime by the use of a suitable lithographic technique in the fabrication of the stamp. Processing issues such as environmental stress cracking of the Topas and the requirements to anti-sticking layers on the stamp when imprinting into Topas are discussed.",
author = "Olsen, {Brian Bilenberg} and Hansen, {Michael S{\o}ren} and V. {\"O}zkapici and C. Jeppesen and Johansen, {Dan Mario} and Peter Szabo and Obieta, {I. M.} and O. Arroyo and Tegendfeldt, {J. O.} and Anders Kristensen",
year = "2005",
doi = "10.1116/1.2091089",
language = "English",
volume = "23",
pages = "2944--2949",
journal = "Journal of Vacuum Science and Technology. Part B. Microelectronics and Nanometer Structures",
issn = "1071-1023",
publisher = "American Institute of Physics",
number = "6",

}

RIS

TY - GEN

T1 - Topas Based Lab-on-a-chip Microsystems Fabricated by Thermal Nanoimprint Lithography

AU - Olsen, Brian Bilenberg

AU - Hansen, Michael Søren

AU - Özkapici, V.

AU - Jeppesen, C.

AU - Johansen, Dan Mario

AU - Szabo, Peter

AU - Obieta, I. M.

AU - Arroyo, O.

AU - Tegendfeldt, J. O.

AU - Kristensen, Anders

PY - 2005

Y1 - 2005

N2 - We, present a one-step technology for fabrication of Topas-based lab-on-a-chip (LOC) microsysterris by the use of thermal nanoimprint lithography (NIL). The technology is demonstrated by the fabrication of two working devices: a particle separator and a LOC with integrated optics for absorbance measurements. These applications demonstrate the fabrication of millimeter to micrometer-sized structures in one lithographic step. The use of NIL makes the technology easily scalable into the nanometer regime by the use of a suitable lithographic technique in the fabrication of the stamp. Processing issues such as environmental stress cracking of the Topas and the requirements to anti-sticking layers on the stamp when imprinting into Topas are discussed.

AB - We, present a one-step technology for fabrication of Topas-based lab-on-a-chip (LOC) microsysterris by the use of thermal nanoimprint lithography (NIL). The technology is demonstrated by the fabrication of two working devices: a particle separator and a LOC with integrated optics for absorbance measurements. These applications demonstrate the fabrication of millimeter to micrometer-sized structures in one lithographic step. The use of NIL makes the technology easily scalable into the nanometer regime by the use of a suitable lithographic technique in the fabrication of the stamp. Processing issues such as environmental stress cracking of the Topas and the requirements to anti-sticking layers on the stamp when imprinting into Topas are discussed.

U2 - 10.1116/1.2091089

DO - 10.1116/1.2091089

M3 - Conference article

VL - 23

SP - 2944

EP - 2949

JO - Journal of Vacuum Science and Technology. Part B. Microelectronics and Nanometer Structures

JF - Journal of Vacuum Science and Technology. Part B. Microelectronics and Nanometer Structures

SN - 1071-1023

IS - 6

ER -