Topas based lab-on-a-chip microsystems fabricated by thermal nanoimprint lithography

Brian Bilenberg Olsen; M. Hansen; C. Jeppesen; D. Nilsson; J.O. Tegenfeldt; Anders Kristensen

Topas based lab-on-a-chip microsystems fabricated by thermal nanoimprint lithography

Brian Bilenberg Olsen, M. Hansen, C. Jeppesen, D. Nilsson, J.O. Tegenfeldt, Anders Kristensen

Research output: Contribution to conference › Poster › Research › peer-review

Original language	English
Publication date	2005
Publication status	Published - 2005
Event	49th International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication - Orlando, FL, United States Duration: 31 May 2005 → 3 Jun 2005 Conference number: 49

Conference

Conference	49th International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication
Number	49
Country/Territory	United States
City	Orlando, FL
Period	31/05/2005 → 03/06/2005

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title = "Topas based lab-on-a-chip microsystems fabricated by thermal nanoimprint lithography",

author = "Olsen, {Brian Bilenberg} and M. Hansen and C. Jeppesen and D. Nilsson and J.O. Tegenfeldt and Anders Kristensen",

year = "2005",

language = "English",

note = "49th International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication, EIPBN49 ; Conference date: 31-05-2005 Through 03-06-2005",

}

Topas based lab-on-a-chip microsystems fabricated by thermal nanoimprint lithography. / Olsen, Brian Bilenberg; Hansen, M.; Jeppesen, C. et al.
2005. Poster session presented at 49th International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication, Orlando, FL, United States.

Research output: Contribution to conference › Poster › Research › peer-review

TY - CONF

T1 - Topas based lab-on-a-chip microsystems fabricated by thermal nanoimprint lithography

AU - Olsen, Brian Bilenberg

AU - Hansen, M.

AU - Jeppesen, C.

AU - Nilsson, D.

AU - Tegenfeldt, J.O.

AU - Kristensen, Anders

N1 - Conference code: 49

PY - 2005

Y1 - 2005

M3 - Poster

T2 - 49th International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication

Y2 - 31 May 2005 through 3 June 2005

ER -