Abstract
| Original language | English |
|---|---|
| Journal | Journal of Vacuum Science and Technolgy Vol |
| Volume | 23 |
| Issue number | 6 |
| Pages (from-to) | 2944-2949 |
| ISSN | 1071-1023 |
| DOIs | |
| Publication status | Published - 2005 |
| Event | 49th International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication - Orlando, FL, United States Duration: 31 May 2005 → 3 Jun 2005 Conference number: 49 |
Conference
| Conference | 49th International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication |
|---|---|
| Number | 49 |
| Country | United States |
| City | Orlando, FL |
| Period | 31/05/2005 → 03/06/2005 |
Cite this
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Topas Based Lab-on-a-chip Microsystems Fabricated by Thermal Nanoimprint Lithography. / Olsen, Brian Bilenberg; Hansen, Michael Søren; Özkapici, V.; Jeppesen, C.; Johansen, Dan Mario; Szabo, Peter; Obieta, I. M.; Arroyo, O.; Tegendfeldt, J. O.; Kristensen, Anders.
In: Journal of Vacuum Science and Technolgy Vol, Vol. 23, No. 6, 2005, p. 2944-2949.Research output: Contribution to journal › Conference article › Research › peer-review
TY - GEN
T1 - Topas Based Lab-on-a-chip Microsystems Fabricated by Thermal Nanoimprint Lithography
AU - Olsen, Brian Bilenberg
AU - Hansen, Michael Søren
AU - Özkapici, V.
AU - Jeppesen, C.
AU - Johansen, Dan Mario
AU - Szabo, Peter
AU - Obieta, I. M.
AU - Arroyo, O.
AU - Tegendfeldt, J. O.
AU - Kristensen, Anders
PY - 2005
Y1 - 2005
N2 - We, present a one-step technology for fabrication of Topas-based lab-on-a-chip (LOC) microsysterris by the use of thermal nanoimprint lithography (NIL). The technology is demonstrated by the fabrication of two working devices: a particle separator and a LOC with integrated optics for absorbance measurements. These applications demonstrate the fabrication of millimeter to micrometer-sized structures in one lithographic step. The use of NIL makes the technology easily scalable into the nanometer regime by the use of a suitable lithographic technique in the fabrication of the stamp. Processing issues such as environmental stress cracking of the Topas and the requirements to anti-sticking layers on the stamp when imprinting into Topas are discussed.
AB - We, present a one-step technology for fabrication of Topas-based lab-on-a-chip (LOC) microsysterris by the use of thermal nanoimprint lithography (NIL). The technology is demonstrated by the fabrication of two working devices: a particle separator and a LOC with integrated optics for absorbance measurements. These applications demonstrate the fabrication of millimeter to micrometer-sized structures in one lithographic step. The use of NIL makes the technology easily scalable into the nanometer regime by the use of a suitable lithographic technique in the fabrication of the stamp. Processing issues such as environmental stress cracking of the Topas and the requirements to anti-sticking layers on the stamp when imprinting into Topas are discussed.
U2 - 10.1116/1.2091089
DO - 10.1116/1.2091089
M3 - Conference article
VL - 23
SP - 2944
EP - 2949
JO - Journal of Vacuum Science and Technology. Part B. Microelectronics and Nanometer Structures
JF - Journal of Vacuum Science and Technology. Part B. Microelectronics and Nanometer Structures
SN - 1071-1023
IS - 6
ER -