Topas Based Lab-on-a-chip Microsystems Fabricated by Thermal Nanoimprint Lithography

Brian Bilenberg Olsen; Michael Søren Hansen; V. Özkapici; C. Jeppesen; Dan Mario Johansen; Peter Szabo; I. M. Obieta; O. Arroyo; J. O. Tegendfeldt; Anders Kristensen

doi:10.1116/1.2091089

Topas Based Lab-on-a-chip Microsystems Fabricated by Thermal Nanoimprint Lithography

Brian Bilenberg Olsen, Michael Søren Hansen, V. Özkapici, C. Jeppesen, Dan Mario Johansen, Peter Szabo, I. M. Obieta, O. Arroyo, J. O. Tegendfeldt, Anders Kristensen

Research output: Contribution to journal › Conference article › Research › peer-review

Abstract

We, present a one-step technology for fabrication of Topas-based lab-on-a-chip (LOC) microsysterris by the use of thermal nanoimprint lithography (NIL). The technology is demonstrated by the fabrication of two working devices: a particle separator and a LOC with integrated optics for absorbance measurements. These applications demonstrate the fabrication of millimeter to micrometer-sized structures in one lithographic step. The use of NIL makes the technology easily scalable into the nanometer regime by the use of a suitable lithographic technique in the fabrication of the stamp. Processing issues such as environmental stress cracking of the Topas and the requirements to anti-sticking layers on the stamp when imprinting into Topas are discussed.

Original language	English
Journal	Journal of Vacuum Science and Technolgy Vol
Volume	23
Issue number	6
Pages (from-to)	2944-2949
ISSN	1071-1023
DOIs	https://doi.org/10.1116/1.2091089
Publication status	Published - 2005
Event	49th International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication - Orlando, FL, United States Duration: 31 May 2005 → 3 Jun 2005 Conference number: 49

Conference

Conference	49th International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication
Number	49
Country	United States
City	Orlando, FL
Period	31/05/2005 → 03/06/2005

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@inproceedings{1699733fd2e540a0a591217580fb22b9,

title = "Topas Based Lab-on-a-chip Microsystems Fabricated by Thermal Nanoimprint Lithography",

abstract = "We, present a one-step technology for fabrication of Topas-based lab-on-a-chip (LOC) microsysterris by the use of thermal nanoimprint lithography (NIL). The technology is demonstrated by the fabrication of two working devices: a particle separator and a LOC with integrated optics for absorbance measurements. These applications demonstrate the fabrication of millimeter to micrometer-sized structures in one lithographic step. The use of NIL makes the technology easily scalable into the nanometer regime by the use of a suitable lithographic technique in the fabrication of the stamp. Processing issues such as environmental stress cracking of the Topas and the requirements to anti-sticking layers on the stamp when imprinting into Topas are discussed.",

author = "Olsen, {Brian Bilenberg} and Hansen, {Michael S{\o}ren} and V. {\"O}zkapici and C. Jeppesen and Johansen, {Dan Mario} and Peter Szabo and Obieta, {I. M.} and O. Arroyo and Tegendfeldt, {J. O.} and Anders Kristensen",

year = "2005",

doi = "10.1116/1.2091089",

language = "English",

volume = "23",

pages = "2944--2949",

journal = "Journal of Vacuum Science and Technology. Part B. Microelectronics and Nanometer Structures",

issn = "1071-1023",

publisher = "American Institute of Physics",

number = "6",

note = "49th International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication, EIPBN49 ; Conference date: 31-05-2005 Through 03-06-2005",

}

Topas Based Lab-on-a-chip Microsystems Fabricated by Thermal Nanoimprint Lithography. / Olsen, Brian Bilenberg; Hansen, Michael Søren; Özkapici, V.; Jeppesen, C.; Johansen, Dan Mario; Szabo, Peter; Obieta, I. M.; Arroyo, O.; Tegendfeldt, J. O.; Kristensen, Anders.

In: Journal of Vacuum Science and Technolgy Vol, Vol. 23, No. 6, 2005, p. 2944-2949.

Research output: Contribution to journal › Conference article › Research › peer-review

TY - GEN

T1 - Topas Based Lab-on-a-chip Microsystems Fabricated by Thermal Nanoimprint Lithography

AU - Olsen, Brian Bilenberg

AU - Hansen, Michael Søren

AU - Özkapici, V.

AU - Jeppesen, C.

AU - Johansen, Dan Mario

AU - Szabo, Peter

AU - Obieta, I. M.

AU - Arroyo, O.

AU - Tegendfeldt, J. O.

AU - Kristensen, Anders

N1 - Conference code: 49

PY - 2005

Y1 - 2005

N2 - We, present a one-step technology for fabrication of Topas-based lab-on-a-chip (LOC) microsysterris by the use of thermal nanoimprint lithography (NIL). The technology is demonstrated by the fabrication of two working devices: a particle separator and a LOC with integrated optics for absorbance measurements. These applications demonstrate the fabrication of millimeter to micrometer-sized structures in one lithographic step. The use of NIL makes the technology easily scalable into the nanometer regime by the use of a suitable lithographic technique in the fabrication of the stamp. Processing issues such as environmental stress cracking of the Topas and the requirements to anti-sticking layers on the stamp when imprinting into Topas are discussed.

AB - We, present a one-step technology for fabrication of Topas-based lab-on-a-chip (LOC) microsysterris by the use of thermal nanoimprint lithography (NIL). The technology is demonstrated by the fabrication of two working devices: a particle separator and a LOC with integrated optics for absorbance measurements. These applications demonstrate the fabrication of millimeter to micrometer-sized structures in one lithographic step. The use of NIL makes the technology easily scalable into the nanometer regime by the use of a suitable lithographic technique in the fabrication of the stamp. Processing issues such as environmental stress cracking of the Topas and the requirements to anti-sticking layers on the stamp when imprinting into Topas are discussed.

U2 - 10.1116/1.2091089

DO - 10.1116/1.2091089

M3 - Conference article

VL - 23

SP - 2944

EP - 2949

JO - Journal of Vacuum Science and Technology. Part B. Microelectronics and Nanometer Structures

JF - Journal of Vacuum Science and Technology. Part B. Microelectronics and Nanometer Structures

SN - 1071-1023

IS - 6

T2 - 49th International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication

Y2 - 31 May 2005 through 3 June 2005

ER -