Topas Based Lab-on-a-chip Microsystems Fabricated by Thermal Nanoimprint Lithography

Brian Bilenberg Olsen, Michael Søren Hansen, V. Özkapici, C. Jeppesen, Dan Mario Johansen, Peter Szabo, I. M. Obieta, O. Arroyo, J. O. Tegendfeldt, Anders Kristensen

Research output: Contribution to journalConference articleResearchpeer-review

Abstract

We, present a one-step technology for fabrication of Topas-based lab-on-a-chip (LOC) microsysterris by the use of thermal nanoimprint lithography (NIL). The technology is demonstrated by the fabrication of two working devices: a particle separator and a LOC with integrated optics for absorbance measurements. These applications demonstrate the fabrication of millimeter to micrometer-sized structures in one lithographic step. The use of NIL makes the technology easily scalable into the nanometer regime by the use of a suitable lithographic technique in the fabrication of the stamp. Processing issues such as environmental stress cracking of the Topas and the requirements to anti-sticking layers on the stamp when imprinting into Topas are discussed.
Original languageEnglish
JournalJournal of Vacuum Science and Technolgy Vol
Volume23
Issue number6
Pages (from-to)2944-2949
ISSN1071-1023
DOIs
Publication statusPublished - 2005
Event49th International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication - Orlando, FL, United States
Duration: 31 May 20053 Jun 2005
Conference number: 49

Conference

Conference49th International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication
Number49
Country/TerritoryUnited States
CityOrlando, FL
Period31/05/200503/06/2005

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