Abstract
We, present a one-step technology for fabrication of Topas-based lab-on-a-chip (LOC) microsysterris by the use of thermal nanoimprint lithography (NIL). The technology is demonstrated by the fabrication of two working devices: a particle separator and a LOC with integrated optics for absorbance measurements. These applications demonstrate the fabrication of millimeter to micrometer-sized structures in one lithographic step. The use of NIL makes the technology easily scalable into the nanometer regime by the use of a suitable lithographic technique in the fabrication of the stamp. Processing issues such as environmental stress cracking of the Topas and the requirements to anti-sticking layers on the stamp when imprinting into Topas are discussed.
Original language | English |
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Journal | Journal of Vacuum Science and Technolgy Vol |
Volume | 23 |
Issue number | 6 |
Pages (from-to) | 2944-2949 |
ISSN | 1071-1023 |
DOIs | |
Publication status | Published - 2005 |
Event | 49th International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication - Orlando, FL, United States Duration: 31 May 2005 → 3 Jun 2005 Conference number: 49 |
Conference
Conference | 49th International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication |
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Number | 49 |
Country/Territory | United States |
City | Orlando, FL |
Period | 31/05/2005 → 03/06/2005 |