Projects per year
Abstract
Three-dimensional
(3D) nanofabrication techniques are of paramount
importance in nanoscience and nanotechnology because they are prerequisites
to realizing complex, compact, and functional 3D nanodevices. Although
several 3D nanofabrication methods have been proposed and developed
in recent years, it is still a formidable challenge to achieve a balance
among resolution, accuracy, simplicity, and adaptability. Here, we
propose a 3D nanofabrication method based on electron-beam lithography
using ice resists (iEBL) and fabricate 3D nanostructures by stacking
layered structures and those with dose-modulated exposure, respectively.
The entire process of 3D nanofabrication is realized in one vacuum
system by skipping the spin-coating and developing steps required
for commonly used resists. This needs far fewer processing steps and
is contamination-free compared with conventional methods. With in
situ alignment and correction in the iEBL process, a pattern resolution
of 20 nm and an alignment error below 100 nm can be steadily achieved.
This 3D nanofabrication technique using ice thus shows great potential
in the fabrication of complicated 3D nanodevices.
Original language | English |
---|---|
Journal | Nano letters |
Volume | 18 |
Issue number | 8 |
Pages (from-to) | 5036–5041 |
ISSN | 1530-6984 |
DOIs | |
Publication status | Published - 2018 |
Keywords
- Nanofabrication
- Three-dimensional nanostructures
- Electron beam lithography
- Ice resists
- Ice lithography
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Projects
- 1 Active
-
COFUNDfellowsDTU: COFUNDfellowsDTU
Brodersen, S. W. & Præstrud, M. R.
01/01/2017 → 31/12/2022
Project: Research