Abstract
| Original language | English |
|---|---|
| Journal | Nano letters |
| Volume | 18 |
| Issue number | 8 |
| Pages (from-to) | 5036–5041 |
| ISSN | 1530-6984 |
| DOIs | |
| Publication status | Published - 2018 |
Keywords
- Nanofabrication
- Three-dimensional nanostructures
- Electron beam lithography
- Ice resists
- Ice lithography
Cite this
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Three-Dimensional in Situ Electron-Beam Lithography Using Water Ice. / Hong, Yu; Zhao, Ding; Liu, Dongli; Ma, Binze; Yao, Guangnan; Li, Qiang; Han, Anpan; Qiu, Min.
In: Nano letters, Vol. 18, No. 8, 2018, p. 5036–5041.Research output: Contribution to journal › Journal article › Research › peer-review
TY - JOUR
T1 - Three-Dimensional in Situ Electron-Beam Lithography Using Water Ice
AU - Hong, Yu
AU - Zhao, Ding
AU - Liu, Dongli
AU - Ma, Binze
AU - Yao, Guangnan
AU - Li, Qiang
AU - Han, Anpan
AU - Qiu, Min
PY - 2018
Y1 - 2018
N2 - Three-dimensional (3D) nanofabrication techniques are of paramount importance in nanoscience and nanotechnology because they are prerequisites to realizing complex, compact, and functional 3D nanodevices. Although several 3D nanofabrication methods have been proposed and developed in recent years, it is still a formidable challenge to achieve a balance among resolution, accuracy, simplicity, and adaptability. Here, we propose a 3D nanofabrication method based on electron-beam lithography using ice resists (iEBL) and fabricate 3D nanostructures by stacking layered structures and those with dose-modulated exposure, respectively. The entire process of 3D nanofabrication is realized in one vacuum system by skipping the spin-coating and developing steps required for commonly used resists. This needs far fewer processing steps and is contamination-free compared with conventional methods. With in situ alignment and correction in the iEBL process, a pattern resolution of 20 nm and an alignment error below 100 nm can be steadily achieved. This 3D nanofabrication technique using ice thus shows great potential in the fabrication of complicated 3D nanodevices.
AB - Three-dimensional (3D) nanofabrication techniques are of paramount importance in nanoscience and nanotechnology because they are prerequisites to realizing complex, compact, and functional 3D nanodevices. Although several 3D nanofabrication methods have been proposed and developed in recent years, it is still a formidable challenge to achieve a balance among resolution, accuracy, simplicity, and adaptability. Here, we propose a 3D nanofabrication method based on electron-beam lithography using ice resists (iEBL) and fabricate 3D nanostructures by stacking layered structures and those with dose-modulated exposure, respectively. The entire process of 3D nanofabrication is realized in one vacuum system by skipping the spin-coating and developing steps required for commonly used resists. This needs far fewer processing steps and is contamination-free compared with conventional methods. With in situ alignment and correction in the iEBL process, a pattern resolution of 20 nm and an alignment error below 100 nm can be steadily achieved. This 3D nanofabrication technique using ice thus shows great potential in the fabrication of complicated 3D nanodevices.
KW - Nanofabrication
KW - Three-dimensional nanostructures
KW - Electron beam lithography
KW - Ice resists
KW - Ice lithography
U2 - 10.1021/acs.nanolett.8b01857
DO - 10.1021/acs.nanolett.8b01857
M3 - Journal article
C2 - 29940114
VL - 18
SP - 5036
EP - 5041
JO - Nano Letters
JF - Nano Letters
SN - 1530-6984
IS - 8
ER -