Three-Dimensional in Situ Electron-Beam Lithography Using Water Ice

Yu Hong, Ding Zhao, Dongli Liu, Binze Ma, Guangnan Yao, Qiang Li, Anpan Han, Min Qiu

    Research output: Contribution to journalJournal articleResearchpeer-review

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    Abstract

    Three-dimensional (3D) nanofabrication techniques are of paramount importance in nanoscience and nanotechnology because they are prerequisites to realizing complex, compact, and functional 3D nanodevices. Although several 3D nanofabrication methods have been proposed and developed in recent years, it is still a formidable challenge to achieve a balance among resolution, accuracy, simplicity, and adaptability. Here, we propose a 3D nanofabrication method based on electron-beam lithography using ice resists (iEBL) and fabricate 3D nanostructures by stacking layered structures and those with dose-modulated exposure, respectively. The entire process of 3D nanofabrication is realized in one vacuum system by skipping the spin-coating and developing steps required for commonly used resists. This needs far fewer processing steps and is contamination-free compared with conventional methods. With in situ alignment and correction in the iEBL process, a pattern resolution of 20 nm and an alignment error below 100 nm can be steadily achieved. This 3D nanofabrication technique using ice thus shows great potential in the fabrication of complicated 3D nanodevices.
    Original languageEnglish
    JournalNano letters
    Volume18
    Issue number8
    Pages (from-to) 5036–5041
    ISSN1530-6984
    DOIs
    Publication statusPublished - 2018

    Keywords

    • Nanofabrication
    • Three-dimensional nanostructures
    • Electron beam lithography
    • Ice resists
    • Ice lithography

    Cite this

    Hong, Y., Zhao, D., Liu, D., Ma, B., Yao, G., Li, Q., ... Qiu, M. (2018). Three-Dimensional in Situ Electron-Beam Lithography Using Water Ice. Nano letters, 18(8), 5036–5041. https://doi.org/10.1021/acs.nanolett.8b01857
    Hong, Yu ; Zhao, Ding ; Liu, Dongli ; Ma, Binze ; Yao, Guangnan ; Li, Qiang ; Han, Anpan ; Qiu, Min. / Three-Dimensional in Situ Electron-Beam Lithography Using Water Ice. In: Nano letters. 2018 ; Vol. 18, No. 8. pp. 5036–5041.
    @article{da739107fd9d498082111f984e43311b,
    title = "Three-Dimensional in Situ Electron-Beam Lithography Using Water Ice",
    abstract = "Three-dimensional (3D) nanofabrication techniques are of paramount importance in nanoscience and nanotechnology because they are prerequisites to realizing complex, compact, and functional 3D nanodevices. Although several 3D nanofabrication methods have been proposed and developed in recent years, it is still a formidable challenge to achieve a balance among resolution, accuracy, simplicity, and adaptability. Here, we propose a 3D nanofabrication method based on electron-beam lithography using ice resists (iEBL) and fabricate 3D nanostructures by stacking layered structures and those with dose-modulated exposure, respectively. The entire process of 3D nanofabrication is realized in one vacuum system by skipping the spin-coating and developing steps required for commonly used resists. This needs far fewer processing steps and is contamination-free compared with conventional methods. With in situ alignment and correction in the iEBL process, a pattern resolution of 20 nm and an alignment error below 100 nm can be steadily achieved. This 3D nanofabrication technique using ice thus shows great potential in the fabrication of complicated 3D nanodevices.",
    keywords = "Nanofabrication, Three-dimensional nanostructures, Electron beam lithography, Ice resists, Ice lithography",
    author = "Yu Hong and Ding Zhao and Dongli Liu and Binze Ma and Guangnan Yao and Qiang Li and Anpan Han and Min Qiu",
    year = "2018",
    doi = "10.1021/acs.nanolett.8b01857",
    language = "English",
    volume = "18",
    pages = "5036–5041",
    journal = "Nano Letters",
    issn = "1530-6984",
    publisher = "American Chemical Society",
    number = "8",

    }

    Hong, Y, Zhao, D, Liu, D, Ma, B, Yao, G, Li, Q, Han, A & Qiu, M 2018, 'Three-Dimensional in Situ Electron-Beam Lithography Using Water Ice', Nano letters, vol. 18, no. 8, pp. 5036–5041. https://doi.org/10.1021/acs.nanolett.8b01857

    Three-Dimensional in Situ Electron-Beam Lithography Using Water Ice. / Hong, Yu; Zhao, Ding; Liu, Dongli; Ma, Binze; Yao, Guangnan; Li, Qiang; Han, Anpan; Qiu, Min.

    In: Nano letters, Vol. 18, No. 8, 2018, p. 5036–5041.

    Research output: Contribution to journalJournal articleResearchpeer-review

    TY - JOUR

    T1 - Three-Dimensional in Situ Electron-Beam Lithography Using Water Ice

    AU - Hong, Yu

    AU - Zhao, Ding

    AU - Liu, Dongli

    AU - Ma, Binze

    AU - Yao, Guangnan

    AU - Li, Qiang

    AU - Han, Anpan

    AU - Qiu, Min

    PY - 2018

    Y1 - 2018

    N2 - Three-dimensional (3D) nanofabrication techniques are of paramount importance in nanoscience and nanotechnology because they are prerequisites to realizing complex, compact, and functional 3D nanodevices. Although several 3D nanofabrication methods have been proposed and developed in recent years, it is still a formidable challenge to achieve a balance among resolution, accuracy, simplicity, and adaptability. Here, we propose a 3D nanofabrication method based on electron-beam lithography using ice resists (iEBL) and fabricate 3D nanostructures by stacking layered structures and those with dose-modulated exposure, respectively. The entire process of 3D nanofabrication is realized in one vacuum system by skipping the spin-coating and developing steps required for commonly used resists. This needs far fewer processing steps and is contamination-free compared with conventional methods. With in situ alignment and correction in the iEBL process, a pattern resolution of 20 nm and an alignment error below 100 nm can be steadily achieved. This 3D nanofabrication technique using ice thus shows great potential in the fabrication of complicated 3D nanodevices.

    AB - Three-dimensional (3D) nanofabrication techniques are of paramount importance in nanoscience and nanotechnology because they are prerequisites to realizing complex, compact, and functional 3D nanodevices. Although several 3D nanofabrication methods have been proposed and developed in recent years, it is still a formidable challenge to achieve a balance among resolution, accuracy, simplicity, and adaptability. Here, we propose a 3D nanofabrication method based on electron-beam lithography using ice resists (iEBL) and fabricate 3D nanostructures by stacking layered structures and those with dose-modulated exposure, respectively. The entire process of 3D nanofabrication is realized in one vacuum system by skipping the spin-coating and developing steps required for commonly used resists. This needs far fewer processing steps and is contamination-free compared with conventional methods. With in situ alignment and correction in the iEBL process, a pattern resolution of 20 nm and an alignment error below 100 nm can be steadily achieved. This 3D nanofabrication technique using ice thus shows great potential in the fabrication of complicated 3D nanodevices.

    KW - Nanofabrication

    KW - Three-dimensional nanostructures

    KW - Electron beam lithography

    KW - Ice resists

    KW - Ice lithography

    U2 - 10.1021/acs.nanolett.8b01857

    DO - 10.1021/acs.nanolett.8b01857

    M3 - Journal article

    C2 - 29940114

    VL - 18

    SP - 5036

    EP - 5041

    JO - Nano Letters

    JF - Nano Letters

    SN - 1530-6984

    IS - 8

    ER -