Abstract
Three-dimensional (3D) nanofabrication techniques are of paramount importance in nanoscience and nanotechnology. Here we propose a 3D nanofabrication method based on electron beam lithography using ice resists (iEBL) and fabricate 3D nanostructures by stacking layered structures and dose-modulated exposing, respectively. The whole process of 3D nanofabrication is realized in one vacuum system by skipping spin-coating and developing steps required for commonly used resists. This needs much less processing steps and is contamination-free as compared to conventional methods.
| Original language | English |
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| Publication date | 2018 |
| Number of pages | 2 |
| Publication status | Published - 2018 |
| Event | 7th Conference on Advances in Optoelectronics and Micro/nano-optics - Xi'an Guangcheng Hotel, Xi'an, Chile Duration: 9 Oct 2018 → 12 Oct 2018 http://aom2018.com/ |
Conference
| Conference | 7th Conference on Advances in Optoelectronics and Micro/nano-optics |
|---|---|
| Location | Xi'an Guangcheng Hotel |
| Country | Chile |
| City | Xi'an |
| Period | 09/10/2018 → 12/10/2018 |
| Internet address |