Three-dimensional Electron Beam Lithography Using Ice Resists

Ding Zhao, Yu Hong, Anpan Han, Min Qiu

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    Three-dimensional (3D) nanofabrication techniques are of paramount importance in nanoscience and nanotechnology. Here we propose a 3D nanofabrication method based on electron beam lithography using ice resists (iEBL) and fabricate 3D nanostructures by stacking layered structures and dose-modulated exposing, respectively. The whole process of 3D nanofabrication is realized in one vacuum system by skipping spin-coating and developing steps required for commonly used resists. This needs much less processing steps and is contamination-free as compared to conventional methods.
    Original languageEnglish
    Publication date2018
    Number of pages2
    Publication statusPublished - 2018
    Event7th Conference on Advances in Optoelectronics and Micro/nano-optics - Xi'an Guangcheng Hotel, Xi'an, China
    Duration: 9 Oct 201812 Oct 2018


    Conference7th Conference on Advances in Optoelectronics and Micro/nano-optics
    LocationXi'an Guangcheng Hotel
    Internet address


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