Three-dimensional Electron Beam Lithography Using Ice Resists

Ding Zhao, Yu Hong, Anpan Han, Min Qiu

    Research output: Contribution to conferenceConference abstract for conferenceResearchpeer-review

    137 Downloads (Pure)

    Abstract

    Three-dimensional (3D) nanofabrication techniques are of paramount importance in nanoscience and nanotechnology. Here we propose a 3D nanofabrication method based on electron beam lithography using ice resists (iEBL) and fabricate 3D nanostructures by stacking layered structures and dose-modulated exposing, respectively. The whole process of 3D nanofabrication is realized in one vacuum system by skipping spin-coating and developing steps required for commonly used resists. This needs much less processing steps and is contamination-free as compared to conventional methods.
    Original languageEnglish
    Publication date2018
    Number of pages2
    Publication statusPublished - 2018
    Event7th Conference on Advances in Optoelectronics and Micro/nano-optics - Xi'an Guangcheng Hotel, Xi'an, Chile
    Duration: 9 Oct 201812 Oct 2018
    http://aom2018.com/

    Conference

    Conference7th Conference on Advances in Optoelectronics and Micro/nano-optics
    LocationXi'an Guangcheng Hotel
    CountryChile
    CityXi'an
    Period09/10/201812/10/2018
    Internet address

    Fingerprint Dive into the research topics of 'Three-dimensional Electron Beam Lithography Using Ice Resists'. Together they form a unique fingerprint.

    Cite this