Three-dimensional (3D) nanofabrication techniques are of paramount importance in nanoscience and nanotechnology. Here we propose a 3D nanofabrication method based on electron beam lithography using ice resists (iEBL) and fabricate 3D nanostructures by stacking layered structures and dose-modulated exposing, respectively. The whole process of 3D nanofabrication is realized in one vacuum system by skipping spin-coating and developing steps required for commonly used resists. This needs much less processing steps and is contamination-free as compared to conventional methods.
|Number of pages||2|
|Publication status||Published - 2018|
|Event||7th Conference on Advances in Optoelectronics and Micro/nano-optics - Xi'an Guangcheng Hotel, Xi'an, Chile|
Duration: 9 Oct 2018 → 12 Oct 2018
|Conference||7th Conference on Advances in Optoelectronics and Micro/nano-optics|
|Location||Xi'an Guangcheng Hotel|
|Period||09/10/2018 → 12/10/2018|