Thickness dependence of the sputtering yield from solid deuterium by light keV ions

B. Stenum; O. Ellegaard; Jørgen Schou; H. Sørensen

doi:10.1016/0168-583X(90)90176-U

Thickness dependence of the sputtering yield from solid deuterium by light keV ions

B. Stenum
, O. Ellegaard
, Jørgen Schou
, H. Sørensen

Research output: Contribution to journal › Journal article › Research › peer-review

Abstract

Measurements of the thickness dependence of the sputtering yield from solid deuterium bombarded by 1-10 keV/amu hydrogen ions are reported. For film thicknesses larger than 2 ×1018 D2/cm2 the yield is largely independent of the film thickness. A strong enhancement of the yield is observed for thin films. The results for different ion energies demonstrate convincingly that this enhancement is a result of the interaction between the primary ion and the metallic substrate rather than a beam-independent structural interface effect.

Original language	English
Journal	Nuclear Inst. and Methods in Physics Research, B
Volume	48
Issue number	1-4
Pages (from-to)	530-533
ISSN	0168-583X
DOIs	https://doi.org/10.1016/0168-583X(90)90176-U
Publication status	Published - 1990

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title = "Thickness dependence of the sputtering yield from solid deuterium by light keV ions",

abstract = "Measurements of the thickness dependence of the sputtering yield from solid deuterium bombarded by 1-10 keV/amu hydrogen ions are reported. For film thicknesses larger than 2 ×1018 D2/cm2 the yield is largely independent of the film thickness. A strong enhancement of the yield is observed for thin films. The results for different ion energies demonstrate convincingly that this enhancement is a result of the interaction between the primary ion and the metallic substrate rather than a beam-independent structural interface effect.",

author = "B. Stenum and O. Ellegaard and J{\o}rgen Schou and H. S{\o}rensen",

year = "1990",

doi = "10.1016/0168-583X(90)90176-U",

language = "English",

volume = "48",

pages = "530--533",

journal = "Nuclear Inst. and Methods in Physics Research, B",

issn = "0168-583X",

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T1 - Thickness dependence of the sputtering yield from solid deuterium by light keV ions

AU - Stenum, B.

AU - Ellegaard, O.

AU - Schou, Jørgen

AU - Sørensen, H.

PY - 1990

Y1 - 1990

N2 - Measurements of the thickness dependence of the sputtering yield from solid deuterium bombarded by 1-10 keV/amu hydrogen ions are reported. For film thicknesses larger than 2 ×1018 D2/cm2 the yield is largely independent of the film thickness. A strong enhancement of the yield is observed for thin films. The results for different ion energies demonstrate convincingly that this enhancement is a result of the interaction between the primary ion and the metallic substrate rather than a beam-independent structural interface effect.

AB - Measurements of the thickness dependence of the sputtering yield from solid deuterium bombarded by 1-10 keV/amu hydrogen ions are reported. For film thicknesses larger than 2 ×1018 D2/cm2 the yield is largely independent of the film thickness. A strong enhancement of the yield is observed for thin films. The results for different ion energies demonstrate convincingly that this enhancement is a result of the interaction between the primary ion and the metallic substrate rather than a beam-independent structural interface effect.

U2 - 10.1016/0168-583X(90)90176-U

DO - 10.1016/0168-583X(90)90176-U

M3 - Journal article

SN - 0168-583X

VL - 48

SP - 530

EP - 533

JO - Nuclear Inst. and Methods in Physics Research, B

JF - Nuclear Inst. and Methods in Physics Research, B

IS - 1-4

ER -

Thickness dependence of the sputtering yield from solid deuterium by light keV ions

Abstract

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