Abstract
Measurements of the thickness dependence of the sputtering yield from solid deuterium bombarded by 1-10 keV/amu hydrogen ions are reported. For film thicknesses larger than 2 ×1018 D2/cm2 the yield is largely independent of the film thickness. A strong enhancement of the yield is observed for thin films. The results for different ion energies demonstrate convincingly that this enhancement is a result of the interaction between the primary ion and the metallic substrate rather than a beam-independent structural interface effect.
Original language | English |
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Journal | Nuclear Inst. and Methods in Physics Research, B |
Volume | 48 |
Issue number | 1-4 |
Pages (from-to) | 530-533 |
ISSN | 0168-583X |
DOIs | |
Publication status | Published - 1990 |