Thickness dependence of the sputtering yield from solid deuterium by light keV ions

B. Stenum, O. Ellegaard, Jørgen Schou, H. Sørensen

    Research output: Contribution to journalJournal articleResearchpeer-review

    Abstract

    Measurements of the thickness dependence of the sputtering yield from solid deuterium bombarded by 1-10 keV/amu hydrogen ions are reported. For film thicknesses larger than 2 ×1018 D2/cm2 the yield is largely independent of the film thickness. A strong enhancement of the yield is observed for thin films. The results for different ion energies demonstrate convincingly that this enhancement is a result of the interaction between the primary ion and the metallic substrate rather than a beam-independent structural interface effect.
    Original languageEnglish
    JournalNuclear Inst. and Methods in Physics Research, B
    Volume48
    Issue number1-4
    Pages (from-to)530-533
    ISSN0168-583X
    DOIs
    Publication statusPublished - 1990

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