TY - JOUR
T1 - Thermal dynamics of few-layer-graphene seals
AU - Rørbech Ambjørner, Hjalte
AU - Bjørnlund, Anton Simon
AU - Bonczyk, Tobias Georg
AU - Dollekamp, Edwin
AU - Kaas, Lau Morten
AU - Colding-Fagerholt, Sofie
AU - Mølhave, Kristian Speranza
AU - Damsgaard, Christian Danvad
AU - Helveg, Stig
AU - Vesborg, Peter Christian Kjærgaard
N1 - This study was funded by the European Research Council (ERC) under the European Union's Horizon 2020 research and innovation programme (Grant Agreement No. 758495) and the Danish National Research Foundation (Grant No. DNRF146). The authors acknowledge the cleanroom facilities at DTU Nanolab – National Centre for Nano Fabrication and Characterization and DTU Physics – Center for Nanostructured Graphene for access to equipment used to fabricate samples. Specifically, the authors are grateful for fruitful discussions with Ass. Prof. Tim Booth and Prof. Peter Bøggild from DTU Physics – Center for Nanostructured Graphene. In addition, we thank Topsoe A/S for access to their ETEM facility and technical support from Topsoe A/S employees Sven Ullmann and Sebastian Pirel Fredsgaard Jespersen.
PY - 2023
Y1 - 2023
N2 - Being of atomic thickness, graphene is the thinnest imaginable membrane. While graphene's basal plane is highly impermeable at the molecular level, the impermeability is, in practice, compromised by leakage pathways located at the graphene-substrate interface. Here, we provide a kinetic analysis of such interface-mediated leakage by probing gas trapped in graphene-sealed SiO2 cavities versus time and temperature using electron energy loss spectroscopy. The results show that gas leakage exhibits an Arrhenius-type temperature dependency with apparent activation energies between 0.2 and 0.7 eV. Surprisingly, the interface leak rate can be improved by several orders of magnitude by thermal processing, which alters the kinetic parameters of the temperature dependency. The present study thus provides fundamental insight into the leakage mechanism while simultaneously demonstrating thermal processing as a generic approach for tightening graphene-based-seals with applications within chemistry and biology.
AB - Being of atomic thickness, graphene is the thinnest imaginable membrane. While graphene's basal plane is highly impermeable at the molecular level, the impermeability is, in practice, compromised by leakage pathways located at the graphene-substrate interface. Here, we provide a kinetic analysis of such interface-mediated leakage by probing gas trapped in graphene-sealed SiO2 cavities versus time and temperature using electron energy loss spectroscopy. The results show that gas leakage exhibits an Arrhenius-type temperature dependency with apparent activation energies between 0.2 and 0.7 eV. Surprisingly, the interface leak rate can be improved by several orders of magnitude by thermal processing, which alters the kinetic parameters of the temperature dependency. The present study thus provides fundamental insight into the leakage mechanism while simultaneously demonstrating thermal processing as a generic approach for tightening graphene-based-seals with applications within chemistry and biology.
U2 - 10.1039/d3nr03459c
DO - 10.1039/d3nr03459c
M3 - Journal article
C2 - 37850513
AN - SCOPUS:85175422287
SN - 2040-3364
VL - 15
SP - 16896
EP - 16903
JO - Nanoscale
JF - Nanoscale
ER -