The Influence of an ASE Etch Process on SU-8 Layer and on the Release Yield of SU-8 Microarticle Filters

Research output: Chapter in Book/Report/Conference proceeding › Article in proceedings › Research › peer-review

Original language	English
Title of host publication	Proceeding of the 3rd International Workshop on Nanomechanical Sensors
Publication date	2008
Publication status	Published - 2008
Event	The 5th International Workshop on Nano Mechanical Sensing - Max Planck Institute for Polymer Research, Mainz, Germany Duration: 19 May 2008 → 21 May 2008 Conference number: 5 http://www.nmc-2016.org/about/

Conference	The 5th International Workshop on Nano Mechanical Sensing
Number	5
Location	Max Planck Institute for Polymer Research
Country/Territory	Germany
City	Mainz
Period	19/05/2008 → 21/05/2008
Other	Originally called “Nano Mechanical Cantilever” meetings
Internet address	http://www.nmc-2016.org/about/

OpenUrl availability

@inproceedings{5e5543a307ce4fb3a30cf357eb6c8bbc,

title = "The Influence of an ASE Etch Process on SU-8 Layer and on the Release Yield of SU-8 Microarticle Filters",

author = "Nadine-Nicole Noeth and Keller, {Stephan Urs} and Anja Boisen",

year = "2008",

language = "English",

booktitle = "Proceeding of the 3rd International Workshop on Nanomechanical Sensors",

note = "The 5th International Workshop on Nano Mechanical Sensing, NMC 2008 ; Conference date: 19-05-2008 Through 21-05-2008",

url = "http://www.nmc-2016.org/about/",

}

TY - GEN

T1 - The Influence of an ASE Etch Process on SU-8 Layer and on the Release Yield of SU-8 Microarticle Filters

AU - Noeth, Nadine-Nicole

AU - Keller, Stephan Urs

AU - Boisen, Anja

N1 - Conference code: 5

PY - 2008

Y1 - 2008

M3 - Article in proceedings

BT - Proceeding of the 3rd International Workshop on Nanomechanical Sensors

T2 - The 5th International Workshop on Nano Mechanical Sensing

Y2 - 19 May 2008 through 21 May 2008

ER -