The frictional properties of titanium carbide, titanium nitride and vanadium carbide: Measurement of a compositional dependence with atomic force microscopy

Seunghwan Lee; Oussama El-bjeirami; Scott S. Perry; Stephen V. Diziulius; Peter Franz; Gouri Radhakrishnan

The frictional properties of titanium carbide, titanium nitride and vanadium carbide: Measurement of a compositional dependence with atomic force microscopy

Seunghwan Lee, Oussama El-bjeirami, Scott S. Perry, Stephen V. Diziulius, Peter Franz, Gouri Radhakrishnan

Research output: Contribution to journal › Journal article › Research › peer-review

Original language	English
Journal	Journal of Vacuum Science and Technology. Part B. Microelectronics and Nanometer Structures
Volume	18
Issue number	1
Pages (from-to)	69-75
ISSN	1071-1023
Publication status	Published - 2000
Externally published	Yes

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@article{7c39fa89f36a4c42b4c0b5b794e1c885,

title = "The frictional properties of titanium carbide, titanium nitride and vanadium carbide: Measurement of a compositional dependence with atomic force microscopy",

author = "Seunghwan Lee and Oussama El-bjeirami and Perry, {Scott S.} and Diziulius, {Stephen V.} and Peter Franz and Gouri Radhakrishnan",

year = "2000",

language = "English",

volume = "18",

pages = "69--75",

journal = "Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures",

issn = "2166-2746",

publisher = "American Institute of Physics",

number = "1",

}

The frictional properties of titanium carbide, titanium nitride and vanadium carbide: Measurement of a compositional dependence with atomic force microscopy. / Lee, Seunghwan; El-bjeirami, Oussama; Perry, Scott S. et al.

In: Journal of Vacuum Science and Technology. Part B. Microelectronics and Nanometer Structures, Vol. 18, No. 1, 2000, p. 69-75.

Research output: Contribution to journal › Journal article › Research › peer-review

TY - JOUR

T1 - The frictional properties of titanium carbide, titanium nitride and vanadium carbide: Measurement of a compositional dependence with atomic force microscopy

AU - Lee, Seunghwan

AU - El-bjeirami, Oussama

AU - Perry, Scott S.

AU - Diziulius, Stephen V.

AU - Franz, Peter

AU - Radhakrishnan, Gouri

PY - 2000

Y1 - 2000

M3 - Journal article

VL - 18

SP - 69

EP - 75

JO - Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

JF - Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

SN - 2166-2746

IS - 1

ER -