The effect of deposition process parameters on thin film coatings for the Athena X-ray optics

S. Massahi*, D. D. M. Ferreira, F. E. Christensen, N. Gellert, S. Svendsen, P. L. Henriksen, A. S'jegers, M. Collon, B. Landgraf, D. Girou, A. Thete, B. Shortt, I. Ferreira, M. Bavdaz, W. Schönberger, A. Langer

*Corresponding author for this work

    Research output: Chapter in Book/Report/Conference proceedingArticle in proceedingsResearchpeer-review

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    Abstract

    The thin film coating technology for the European Space Agency mission, Advanced Telescope for High-Energy Astrophysics (Athena) has been established. The X-ray optics of the Athena telescope is based on Silicon Pore Optics (SPO) technology which is enhanced by the thin film coatings deposited on the reflective surface of the SPO plates. In this work, we present a literature study of the coating process parameter space and provide an overview of the thin film properties with a focus on micro roughness, chemical composition and wear resistance when deposited under various process conditions. We determined, that the thin film density depends strongly on the mobility of the adatoms on the substrate surface. Some coating process parameters, which have a significant impact on the adatom mobility are the discharge voltage, the working gas pressure and the substrate temperature.

    Original languageEnglish
    Title of host publicationProceedings of SPIE : Optics for EUV, X-Ray, and Gamma-Ray Astronomy X
    EditorsStephen L. O'Dell, Jessica A. Gaskin, Giovanni Pareschi
    Number of pages10
    PublisherSPIE - International Society for Optical Engineering
    Publication date2021
    Article number118220B
    ISBN (Electronic)9781510644823
    DOIs
    Publication statusPublished - 2021
    SeriesProceedings of SPIE - The International Society for Optical Engineering
    Volume11822
    ISSN0277-786X

    Keywords

    • Athena
    • DC magnetron sputtering
    • Silicon pore optics
    • X-ray optics

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