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The Chemical Vapour Deposition of Tantalum - in long narrow channels
James Atwoki Mugabi
Department of Energy Conversion and Storage
Research output
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Book/Report
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Ph.D. thesis
4993
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Dive into the research topics of 'The Chemical Vapour Deposition of Tantalum - in long narrow channels'. Together they form a unique fingerprint.
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Engineering
Narrow Channel
100%
Chemical Vapor Deposition
100%
Vapor Deposition
100%
Pressure Range
66%
Plate Heat Exchanger
66%
Deposition Rate
66%
Computational Fluid Dynamics
33%
Temperature Range
33%
Kinetic Model
33%
Control Parameter
33%
Major Change
33%
Thermal Model
33%
Process Equipment
33%
Fit Model
33%
System Pressure
33%
Reactant Concentration
33%
Protective Layer
33%
Coated Plate
33%
Steel Tube
33%
Alfa-Laval
33%
Scanning Electron Microscope
33%
Partial Pressure
33%
Dynamic Models
33%
Stainless Steel
33%
Material Science
Tantalum
100%
Chemical Vapor Deposition
100%
Building Material
20%
Corrosion
20%
Scanning Electron Microscopy
10%
Coating Process
10%
Protective Coating
10%
Stainless Steel
10%
Computational Fluid Dynamics
10%
Surface Reaction
10%
Chemical Engineering
Chemical Vapor Deposition
100%
Vapor Deposition
100%
Deposition Rate
66%
Keyphrases
Prime Solution
11%
Coat Complexes
11%