Systematic and robust design of photonic crystal waveguides by topology optimization

Fengwen Wang; Jakob Søndergaard Jensen; Ole Sigmund

doi:10.1063/1.3506109

Systematic and robust design of photonic crystal waveguides by topology optimization

Fengwen Wang (Invited author), Jakob Søndergaard Jensen (Invited author), Ole Sigmund (Invited author)

Research output: Contribution to journal › Conference article › Research › peer-review

Abstract

A robust topology optimization method is presented to consider manufacturing uncertainties in tailoring dispersion properties of photonic crystal waveguides. The under, normal and over-etching scenarios in manufacturing process are represented by dilated, intermediate and eroded designs based on a threshold projection. The objective is formulated to minimize the maximum error between actual group indices and a prescribed group index among these three designs. Novel photonic crystal waveguide facilitating slow light with a group index of n(g) = 40 is achieved by the robust optimization approach. The numerical result illustrates that the robust topology optimization provides a systematic and robust design methodology for photonic crystal waveguide design.

Original language	English
Journal	A I P Conference Proceedings Series
Volume	1291
Pages (from-to)	155-157
ISSN	0094-243X
DOIs	https://doi.org/10.1063/1.3506109
Publication status	Published - 2010
Event	3rd International Workshop on Theoretical and Computational Nano-Photonics - Bad Honnef, Germany Duration: 3 Nov 2010 → 5 Nov 2010 Conference number: 3

Workshop

Workshop	3rd International Workshop on Theoretical and Computational Nano-Photonics
Number	3
Country/Territory	Germany
City	Bad Honnef
Period	03/11/2010 → 05/11/2010

Keywords

Crystal optics
Robust optimization
Manufacturing processes
Energy gap (physics)
Photons
Permittivity
Wave guides

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title = "Systematic and robust design of photonic crystal waveguides by topology optimization",

abstract = "A robust topology optimization method is presented to consider manufacturing uncertainties in tailoring dispersion properties of photonic crystal waveguides. The under, normal and over-etching scenarios in manufacturing process are represented by dilated, intermediate and eroded designs based on a threshold projection. The objective is formulated to minimize the maximum error between actual group indices and a prescribed group index among these three designs. Novel photonic crystal waveguide facilitating slow light with a group index of n(g) = 40 is achieved by the robust optimization approach. The numerical result illustrates that the robust topology optimization provides a systematic and robust design methodology for photonic crystal waveguide design.",

keywords = "Crystal optics, Robust optimization, Manufacturing processes, Energy gap (physics), Photons, Permittivity, Wave guides",

author = "Fengwen Wang and Jensen, {Jakob S{\o}ndergaard} and Ole Sigmund",

year = "2010",

doi = "10.1063/1.3506109",

language = "English",

volume = "1291",

pages = "155--157",

journal = "A I P Conference Proceedings Series",

issn = "0094-243X",

publisher = "American Institute of Physics",

note = "3rd International Workshop on Theoretical and Computational Nano-Photonics, Tacona-photonics ; Conference date: 03-11-2010 Through 05-11-2010",

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TY - GEN

T1 - Systematic and robust design of photonic crystal waveguides by topology optimization

AU - Wang, Fengwen

AU - Jensen, Jakob Søndergaard

AU - Sigmund, Ole

N1 - Conference code: 3

PY - 2010

Y1 - 2010

N2 - A robust topology optimization method is presented to consider manufacturing uncertainties in tailoring dispersion properties of photonic crystal waveguides. The under, normal and over-etching scenarios in manufacturing process are represented by dilated, intermediate and eroded designs based on a threshold projection. The objective is formulated to minimize the maximum error between actual group indices and a prescribed group index among these three designs. Novel photonic crystal waveguide facilitating slow light with a group index of n(g) = 40 is achieved by the robust optimization approach. The numerical result illustrates that the robust topology optimization provides a systematic and robust design methodology for photonic crystal waveguide design.

AB - A robust topology optimization method is presented to consider manufacturing uncertainties in tailoring dispersion properties of photonic crystal waveguides. The under, normal and over-etching scenarios in manufacturing process are represented by dilated, intermediate and eroded designs based on a threshold projection. The objective is formulated to minimize the maximum error between actual group indices and a prescribed group index among these three designs. Novel photonic crystal waveguide facilitating slow light with a group index of n(g) = 40 is achieved by the robust optimization approach. The numerical result illustrates that the robust topology optimization provides a systematic and robust design methodology for photonic crystal waveguide design.

KW - Crystal optics

KW - Robust optimization

KW - Manufacturing processes

KW - Energy gap (physics)

KW - Photons

KW - Permittivity

KW - Wave guides

U2 - 10.1063/1.3506109

DO - 10.1063/1.3506109

M3 - Conference article

SN - 0094-243X

VL - 1291

SP - 155

EP - 157

JO - A I P Conference Proceedings Series

JF - A I P Conference Proceedings Series

T2 - 3rd International Workshop on Theoretical and Computational Nano-Photonics

Y2 - 3 November 2010 through 5 November 2010

ER -

Systematic and robust design of photonic crystal waveguides by topology optimization

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Keywords

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