Systematic and robust design of photonic crystal waveguides by topology optimization

Fengwen Wang (Invited author), Jakob Søndergaard Jensen (Invited author), Ole Sigmund (Invited author)

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Abstract

A robust topology optimization method is presented to consider manufacturing uncertainties in tailoring dispersion properties of photonic crystal waveguides. The under, normal and over-etching scenarios in manufacturing process are represented by dilated, intermediate and eroded designs based on a threshold projection. The objective is formulated to minimize the maximum error between actual group indices and a prescribed group index among these three designs. Novel photonic crystal waveguide facilitating slow light with a group index of n(g) = 40 is achieved by the robust optimization approach. The numerical result illustrates that the robust topology optimization provides a systematic and robust design methodology for photonic crystal waveguide design.
Original languageEnglish
JournalA I P Conference Proceedings Series
Volume1291
Pages (from-to)155-157
ISSN0094-243X
DOIs
Publication statusPublished - 2010
Event3rd International Workshop on Theoretical and Computational Nano-Photonics - Bad Honnef, Germany
Duration: 3 Nov 20105 Nov 2010
Conference number: 3

Workshop

Workshop3rd International Workshop on Theoretical and Computational Nano-Photonics
Number3
Country/TerritoryGermany
CityBad Honnef
Period03/11/201005/11/2010

Keywords

  • Crystal optics
  • Robust optimization
  • Manufacturing processes
  • Energy gap (physics)
  • Photons
  • Permittivity
  • Wave guides

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