Surface morphology of PS-PDMS diblock copolymer films

T.H. Andersen, S. Tougaard, N.B. Larsen, K. Almdal, I. Johannsen

    Research output: Contribution to journalJournal articleResearchpeer-review

    Abstract

    Spin coated thin films (∼400 Å) of poly(styrene)–poly(dimethylsiloxane) (PS–PDMS) diblock copolymers have been investigated using X-ray Photoelectron Spectroscopy and Atomic Force Microscopy. Surface segregation of the poly(dimethylsiloxane) blocks was studied for five diblock copolymers which ranged in molecular weight from 7 kg/mol to 500 kg/mol. The films were annealed above and below the highest glass transition temperature of the two polymer blocks but below the order–disorder transition temperature. Information concerning the chemical in-depth distribution of the films was extracted by use of peak shape analysis of the X-ray Photoelectron Spectra via the Tougaard Method. The amount of dimethylsiloxane in the uppermost part of the films was quantified as a function of annealing time and temperature. For annealing above the PS glass transition temperature, surface segregation of the dimethylsiloxane chain-ends occurs for all the studied PS–PDMS diblock copolymers. At room temperature, surface segregation takes place only when the amount of dimethylsiloxane in the diblock copolymers is small.
    Original languageEnglish
    JournalJournal of Electron Spectroscopy and Related Phenomena
    Volume121
    Issue number1-3
    Pages (from-to)93-110
    ISSN0368-2048
    DOIs
    Publication statusPublished - 2001

    Keywords

    • Diblock copolymers
    • PS–PDMS
    • X-ray photoelectron spectroscopy
    • Surface structure
    • Morphology
    • Atomic force microscopy

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