Surface investigation of ion dose non-uniformity due to modal and discrete focusing effects during PIII of silicon

N. Holtzer, Eugen Stamate, H. Sugai

Research output: Chapter in Book/Report/Conference proceedingConference abstract in proceedingsResearchpeer-review

Original languageEnglish
Title of host publicationProceedings of the 6th International Conference on Reactive Plasmas (ICRP)
Number of pages2
Publication date2006
Pages417-418
Publication statusPublished - 2006
Externally publishedYes
Event6th International Conference on Reactive Plasmas - Hotel Taikanso, Sendai, Japan
Duration: 24 Jan 200627 Jan 2006

Conference

Conference6th International Conference on Reactive Plasmas
LocationHotel Taikanso
CountryJapan
CitySendai
Period24/01/200627/01/2006

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