TY - JOUR
T1 - Study of underpotential deposited Cu layers on Pt(111) and their stability against CO and CO2 in perchloric acid
AU - Schlaup, Christian Georg
AU - Horch, Sebastian
N1 - Creative Commons Attribution 3.0 Unported Licence
PY - 2013
Y1 - 2013
N2 - The underpotential deposition (UPD) of copper on a Pt(111) electrode and the influence of gas coadsorbates, i.e. CO and CO2, on the thus deposited copper layer were studied in a 0.1 M HClO4 electrolyte by means of EC-STM. By UPD, an atomically flat Cu layer is formed, which exhibits a pseudomorphic (1 × 1) structure. However, it contains several point defects due to which its total coverage is less than a monolayer, in agreement with the measured charge density in the CV curves. Upon exposure to a CO-saturated solution the pseudomorphic structure collapses to a coalescent structure with many vacancy islands. This phase transition is induced by the preferential binding of CO to the Pt(111) surface. In contrast, CO2, which binds stronger to copper, does not affect the pseudomorphic structure of the Cu layer.
AB - The underpotential deposition (UPD) of copper on a Pt(111) electrode and the influence of gas coadsorbates, i.e. CO and CO2, on the thus deposited copper layer were studied in a 0.1 M HClO4 electrolyte by means of EC-STM. By UPD, an atomically flat Cu layer is formed, which exhibits a pseudomorphic (1 × 1) structure. However, it contains several point defects due to which its total coverage is less than a monolayer, in agreement with the measured charge density in the CV curves. Upon exposure to a CO-saturated solution the pseudomorphic structure collapses to a coalescent structure with many vacancy islands. This phase transition is induced by the preferential binding of CO to the Pt(111) surface. In contrast, CO2, which binds stronger to copper, does not affect the pseudomorphic structure of the Cu layer.
U2 - 10.1039/c3cp52649f
DO - 10.1039/c3cp52649f
M3 - Journal article
C2 - 24131953
SN - 1463-9076
VL - 15
SP - 19659
EP - 19664
JO - Physical Chemistry Chemical Physics
JF - Physical Chemistry Chemical Physics
IS - 45
ER -