Structure of the Buried Metal-Molecule Interface in Organic Thin Film Devices

Christian R. Hansen; Thomas J. Sørensen; Magni Glyvradal; Jacob Larsen; Sara H. Eisenhardt; Thomas Bjørnholm; Martin Meedom Nielsen; Robert Feidenhans’l; Bo W. Laursen

doi:10.1021/nl803393m

Structure of the Buried Metal-Molecule Interface in Organic Thin Film Devices

Christian R. Hansen
, Thomas J. Sørensen
, Magni Glyvradal
, Jacob Larsen
, Sara H. Eisenhardt
, Thomas Bjørnholm
, Martin Meedom Nielsen
, Robert Feidenhans’l
, Bo W. Laursen

University of Copenhagen

Research output: Contribution to journal › Journal article › Research › peer-review

Abstract

By use of specular X-ray reflectivity (XR) the structure of a metal-covered organic thin film device is measured with angstrom resolution. The model system is a Langmuir-Blodgett (LB) film, sandwiched between a silicon substrate and a top electrode consisting of 25 angstrom titanium and 100 angstrom aluminum. By comparison of XR data for the five-layer Pb(2+) arachidate LB film before and after vapor deposition of the Ti/Al top electrode, a detailed account of the structural damage to the organic film at the buried metal-molecule interface is obtained. We find that the organized structure of the two topmost LB layers (similar to 5 nm) is completely destroyed due to the metal deposition.

Original language	English
Journal	Nano Letters
Volume	9
Issue number	3
Pages (from-to)	1052-1057
ISSN	1530-6984
DOIs	https://doi.org/10.1021/nl803393m
Publication status	Published - 2009
Externally published	Yes

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@article{7c34a35012aa40cb88aefbcc13ea4270,

title = "Structure of the Buried Metal-Molecule Interface in Organic Thin Film Devices",

abstract = "By use of specular X-ray reflectivity (XR) the structure of a metal-covered organic thin film device is measured with angstrom resolution. The model system is a Langmuir-Blodgett (LB) film, sandwiched between a silicon substrate and a top electrode consisting of 25 angstrom titanium and 100 angstrom aluminum. By comparison of XR data for the five-layer Pb(2+) arachidate LB film before and after vapor deposition of the Ti/Al top electrode, a detailed account of the structural damage to the organic film at the buried metal-molecule interface is obtained. We find that the organized structure of the two topmost LB layers (similar to 5 nm) is completely destroyed due to the metal deposition.",

author = "Hansen, \{Christian R.\} and S{\o}rensen, \{Thomas J.\} and Magni Glyvradal and Jacob Larsen and Eisenhardt, \{Sara H.\} and Thomas Bj{\o}rnholm and Nielsen, \{Martin Meedom\} and Robert Feidenhans{\textquoteright}l and Laursen, \{Bo W.\}",

year = "2009",

doi = "10.1021/nl803393m",

language = "English",

volume = "9",

pages = "1052--1057",

journal = "Nano Letters",

issn = "1530-6984",

publisher = "American Chemical Society",

number = "3",

}

TY - JOUR

T1 - Structure of the Buried Metal-Molecule Interface in Organic Thin Film Devices

AU - Hansen, Christian R.

AU - Sørensen, Thomas J.

AU - Glyvradal, Magni

AU - Larsen, Jacob

AU - Eisenhardt, Sara H.

AU - Bjørnholm, Thomas

AU - Nielsen, Martin Meedom

AU - Feidenhans’l, Robert

AU - Laursen, Bo W.

PY - 2009

Y1 - 2009

N2 - By use of specular X-ray reflectivity (XR) the structure of a metal-covered organic thin film device is measured with angstrom resolution. The model system is a Langmuir-Blodgett (LB) film, sandwiched between a silicon substrate and a top electrode consisting of 25 angstrom titanium and 100 angstrom aluminum. By comparison of XR data for the five-layer Pb(2+) arachidate LB film before and after vapor deposition of the Ti/Al top electrode, a detailed account of the structural damage to the organic film at the buried metal-molecule interface is obtained. We find that the organized structure of the two topmost LB layers (similar to 5 nm) is completely destroyed due to the metal deposition.

AB - By use of specular X-ray reflectivity (XR) the structure of a metal-covered organic thin film device is measured with angstrom resolution. The model system is a Langmuir-Blodgett (LB) film, sandwiched between a silicon substrate and a top electrode consisting of 25 angstrom titanium and 100 angstrom aluminum. By comparison of XR data for the five-layer Pb(2+) arachidate LB film before and after vapor deposition of the Ti/Al top electrode, a detailed account of the structural damage to the organic film at the buried metal-molecule interface is obtained. We find that the organized structure of the two topmost LB layers (similar to 5 nm) is completely destroyed due to the metal deposition.

U2 - 10.1021/nl803393m

DO - 10.1021/nl803393m

M3 - Journal article

C2 - 19199753

SN - 1530-6984

VL - 9

SP - 1052

EP - 1057

JO - Nano Letters

JF - Nano Letters

IS - 3

ER -

Structure of the Buried Metal-Molecule Interface in Organic Thin Film Devices

Abstract

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