Structure of the Buried Metal-Molecule Interface in Organic Thin Film Devices

Christian R. Hansen, Thomas J. Sørensen, Magni Glyvradal, Jacob Larsen, Sara H. Eisenhardt, Thomas Bjørnholm, Martin Meedom Nielsen, Robert Feidenhans’l, Bo W. Laursen

Research output: Contribution to journalJournal articleResearchpeer-review


By use of specular X-ray reflectivity (XR) the structure of a metal-covered organic thin film device is measured with angstrom resolution. The model system is a Langmuir-Blodgett (LB) film, sandwiched between a silicon substrate and a top electrode consisting of 25 angstrom titanium and 100 angstrom aluminum. By comparison of XR data for the five-layer Pb(2+) arachidate LB film before and after vapor deposition of the Ti/Al top electrode, a detailed account of the structural damage to the organic film at the buried metal-molecule interface is obtained. We find that the organized structure of the two topmost LB layers (similar to 5 nm) is completely destroyed due to the metal deposition.
Original languageEnglish
JournalNano Letters
Issue number3
Pages (from-to)1052-1057
Publication statusPublished - 2009
Externally publishedYes


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