Abstract
By use of specular X-ray reflectivity (XR) the structure of a metal-covered organic thin film device is measured with angstrom resolution. The model system is a Langmuir-Blodgett (LB) film, sandwiched between a silicon substrate and a top electrode consisting of 25 angstrom titanium and 100 angstrom aluminum. By comparison of XR data for the five-layer Pb(2+) arachidate LB film before and after vapor deposition of the Ti/Al top electrode, a detailed account of the structural damage to the organic film at the buried metal-molecule interface is obtained. We find that the organized structure of the two topmost LB layers (similar to 5 nm) is completely destroyed due to the metal deposition.
Original language | English |
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Journal | Nano Letters |
Volume | 9 |
Issue number | 3 |
Pages (from-to) | 1052-1057 |
ISSN | 1530-6984 |
DOIs | |
Publication status | Published - 2009 |
Externally published | Yes |