Structure and Electrical Properties of NdBa2Cu3Oy Thin Films by Laser Ablation at Low Oxygen Partial Pressure

Peter B. Mozhaev, Julia Mozhaeva, Alexey Khoryushin, Alexey V. Puriy, Jørn Otto Bindslev Hansen, Claus Schelde Jacobsen

Research output: Contribution to journalJournal articleResearchpeer-review

Abstract

A deposition process for NdBa2Cu3Oy thin films by laser ablation at decreased deposition temperature was developed using substitution of oxygen with argon in the chamber during deposition. A low deposition rate is the crucial factor to obtain high-quality NBCO films. The Nd/Ba cation disorder in the film can be suppressed by an increase of the deposition temperature or by a decrease of the oxygen partial pressure during deposition. The presence of Nd/Ba disorder during deposition stimulates the introduction of oxygen into the growing film. A simple model is proposed for estimation of oxygen contents in the film using structural parameters measured with XRD techniques. Studies of the post-deposition annealing process showed ordering of the Nd/Ba sub-lattice and intense oxygen in- and out-diffusion. The temperature of the post-deposition annealing step should be chosen low enough (∼400 °C) to avoid oxygen diffusion out of the NBCO film.
Original languageEnglish
JournalJournal of Superconductivity and Novel Magnetism
Volume30
Issue number7
Pages (from-to)1781-1794
Number of pages14
ISSN1557-1939
DOIs
Publication statusPublished - 2017

Keywords

  • High-temperature superconducting cuprate NdBa2Cu3O7
  • Ionic mobility during annealing
  • Optimization of PLD process
  • Oxygen incorporation during film growth

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