Status of the silicon pore optics technology

Maximilien J. Collon*, Giuseppe Vacanti, Nicolas M. Barriere, Boris Landgraf, Ramses Günther, Mark Vervest, Luc Voruz, Sjoerd Verhoeckx, Ljubiša Babić, Laurens Keek, David Alain Girou, Ben Okma, Enrico Hauser, Marco W. Beijersbergen, Marcos Bavdaz, Eric Wille, Sebastiaan Fransen, Brian Shortt, Ivo Ferreira, Jeroen HaneveldArenda Koelewijn, Ronald Start, Maurice Wijnperle, Jan-Joost Lankwarden, Coen van Baren, Paul Hieltjes, Jan Willem den Herder, Peter Müller, Evelyn Handick, Michael Krumrey, Miranda Bradshaw, Vadim Burwitz, Giovanni Pareschi, Sonny Massahi, Sara Svendsen, Desiree Della Monica Ferreira, Finn Erland Christensen, Giuseppe Valsecchi, Paul Oliver, Ian Chequer, Kevin Ball

*Corresponding author for this work

    Research output: Chapter in Book/Report/Conference proceedingArticle in proceedingsResearchpeer-review

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    Abstract

    Silicon Pore Optics (SPO) uses commercially available monocrystalline double-sided super-polished silicon wafers as a basis to produce mirrors that form lightweight and stiff high-resolution x-ray optics. The technology has been invented by cosine and the European Space Agency (ESA) and developed together with scientific and industrial partners to mass production levels. SPO is an enabling element for large space-based x-ray telescopes such as Athena and ARCUS, operating in the 0.2 to 12 keV band, with angular resolution requirements up to 5 arc seconds. SPO has also shown to be a versatile technology that can be further developed for gamma-ray optics, medical applications and for material research. This paper will summarise the status of the technology and of the mass production capabilities, show latest performance results and discuss the next steps in the development.
    Original languageEnglish
    Title of host publicationOptics for EUV, X-Ray, and Gamma-Ray Astronomy IX
    EditorsStephen L. O'Dell , Giovanni Pareschi
    Number of pages8
    Volume11119
    PublisherSPIE - International Society for Optical Engineering
    Publication date2019
    Pages111190L-1-11190L-8
    DOIs
    Publication statusPublished - 2019
    EventSPIE Optical Engineering + Applications 2019 - San Diego, United States
    Duration: 11 Aug 201915 Aug 2019

    Conference

    ConferenceSPIE Optical Engineering + Applications 2019
    Country/TerritoryUnited States
    CitySan Diego
    Period11/08/201915/08/2019
    SeriesProceedings of SPIE - The International Society for Optical Engineering
    ISSN0277-786X

    Keywords

    • X-ray optics
    • X-ray astronomy
    • Silicon
    • Wafer
    • Stack
    • Pore optics
    • X-ray telescopes
    • ATHENA
    • ARCUS
    • SPO

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