Status of the silicon pore optics technology

Maximilien J. Collon*, Giuseppe Vacanti, Nicolas M. Barriere, Boris Landgraf, Ramses Günther, Mark Vervest, Luc Voruz, Sjoerd Verhoeckx, Ljubiša Babić, Laurens Keek, David Alain Girou, Ben Okma, Enrico Hauser, Marco W. Beijersbergen, Marcos Bavdaz, Eric Wille, Sebastiaan Fransen, Brian Shortt, Ivo Ferreira, Jeroen HaneveldArenda Koelewijn, Ronald Start, Maurice Wijnperle, Jan-Joost Lankwarden, Coen van Baren, Paul Hieltjes, Jan Willem den Herder, Peter Müller, Evelyn Handick, Michael Krumrey, Miranda Bradshaw, Vadim Burwitz, Giovanni Pareschi, Sonny Massahi, Sara Svendsen, Desiree Della Monica Ferreira, Finn Erland Christensen, Giuseppe Valsecchi, Paul Oliver, Ian Chequer, Kevin Ball

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingArticle in proceedingsResearchpeer-review

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Abstract

Silicon Pore Optics (SPO) uses commercially available monocrystalline double-sided super-polished silicon wafers as a basis to produce mirrors that form lightweight and stiff high-resolution x-ray optics. The technology has been invented by cosine and the European Space Agency (ESA) and developed together with scientific and industrial partners to mass production levels. SPO is an enabling element for large space-based x-ray telescopes such as Athena and ARCUS, operating in the 0.2 to 12 keV band, with angular resolution requirements up to 5 arc seconds. SPO has also shown to be a versatile technology that can be further developed for gamma-ray optics, medical applications and for material research. This paper will summarise the status of the technology and of the mass production capabilities, show latest performance results and discuss the next steps in the development.
Original languageEnglish
Title of host publicationOptics for EUV, X-Ray, and Gamma-Ray Astronomy IX
EditorsStephen L. O'Dell , Giovanni Pareschi
Number of pages8
Volume11119
PublisherSPIE - International Society for Optical Engineering
Publication date2019
Pages111190L-1-11190L-8
DOIs
Publication statusPublished - 2019
Event2019 SPIE Optical Engineering + Applications - San Diego, United States
Duration: 11 Aug 201915 Aug 2019

Conference

Conference2019 SPIE Optical Engineering + Applications
CountryUnited States
CitySan Diego
Period11/08/201915/08/2019
SeriesProceedings of S P I E - International Society for Optical Engineering
ISSN0277-786X

Keywords

  • X-ray optics
  • X-ray astronomy
  • Silicon
  • Wafer
  • Stack
  • Pore optics
  • X-ray telescopes
  • ATHENA
  • ARCUS
  • SPO

Cite this

Collon, M. J., Vacanti, G., Barriere, N. M., Landgraf, B., Günther, R., Vervest, M., Voruz, L., Verhoeckx, S., Babić, L., Keek, L., Girou, D. A., Okma, B., Hauser, E., Beijersbergen, M. W., Bavdaz, M., Wille, E., Fransen, S., Shortt, B., Ferreira, I., ... Ball, K. (2019). Status of the silicon pore optics technology. In S. L. OD., & G. P. (Eds.), Optics for EUV, X-Ray, and Gamma-Ray Astronomy IX (Vol. 11119, pp. 111190L-1-11190L-8). SPIE - International Society for Optical Engineering. Proceedings of S P I E - International Society for Optical Engineering https://doi.org/10.1117/12.2530696