Abstract
Sputtering of thick films of solid deuterium up to several μm by keV electrons is reported for the first time. The sputtering yield increases within a narrow range of thicknesses around 1.6 μm by about 2 orders of magnitude for 1.5 keV electrons. A similar behavior has not been observed for ion bombardment. The yield enhancement is accompanied by an increasing electron accumulation in the film.
| Original language | English |
|---|---|
| Journal | Physical Review Letters |
| Volume | 73 |
| Issue number | 10 |
| Pages (from-to) | 1444-1447 |
| ISSN | 0031-9007 |
| DOIs | |
| Publication status | Published - 1994 |
Bibliographical note
Copyright 1994 American Physical SocietyFingerprint
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