Sputtering of Thick Deuterium Films by KeV Electrons

Birgitte Thestrup Nielsen; Winnie Edith Svendsen; Jørgen Schou; Ole Ellegaard

doi:10.1103/PhysRevLett.73.1444

Sputtering of Thick Deuterium Films by KeV Electrons

Birgitte Thestrup Nielsen, Winnie Edith Svendsen, Jørgen Schou, Ole Ellegaard

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Abstract

Sputtering of thick films of solid deuterium up to several μm by keV electrons is reported for the first time. The sputtering yield increases within a narrow range of thicknesses around 1.6 μm by about 2 orders of magnitude for 1.5 keV electrons. A similar behavior has not been observed for ion bombardment. The yield enhancement is accompanied by an increasing electron accumulation in the film.

Original language	English
Journal	Physical Review Letters
Volume	73
Issue number	10
Pages (from-to)	1444-1447
ISSN	0031-9007
DOIs	https://doi.org/10.1103/PhysRevLett.73.1444
Publication status	Published - 1994

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abstract = "Sputtering of thick films of solid deuterium up to several μm by keV electrons is reported for the first time. The sputtering yield increases within a narrow range of thicknesses around 1.6 μm by about 2 orders of magnitude for 1.5 keV electrons. A similar behavior has not been observed for ion bombardment. The yield enhancement is accompanied by an increasing electron accumulation in the film.",

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AU - Thestrup Nielsen, Birgitte

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AU - Schou, Jørgen

AU - Ellegaard, Ole

PY - 1994

Y1 - 1994

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AB - Sputtering of thick films of solid deuterium up to several μm by keV electrons is reported for the first time. The sputtering yield increases within a narrow range of thicknesses around 1.6 μm by about 2 orders of magnitude for 1.5 keV electrons. A similar behavior has not been observed for ion bombardment. The yield enhancement is accompanied by an increasing electron accumulation in the film.

KW - Optisk måleteknik og informationsbehandling

U2 - 10.1103/PhysRevLett.73.1444

DO - 10.1103/PhysRevLett.73.1444

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Sputtering of Thick Deuterium Films by KeV Electrons

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