Soft-graphoepitaxy using nanoimprinted polyhedral oligomeric silsesquioxane substrates for the directed self-assembly of PS-b-PDMS

Dipu Borah, Claudia D. Simao, Ramsankar Senthamaraikannan, Sozaraj Rasappa, Achille Francone, Olivier Lorret, Mathieu Salaun, Barbara Kosmala, Nikolaos Kehagias, Marc Zelsmann, Clivia M. Sotomayor-Torres, Michael A. Morris

Research output: Contribution to journalJournal article

Abstract

We report here the fabrication of periodic sub-25nm diameter size cylinder structures using block copolymer (BCP) directed self-assembly on nanoimprinted topographically patterned substrates. Tailored polyhedral oligomeric silsesquioxanes (POSSs) films were spin coated onto silicon substrates and were patterned by nanoimprint lithography to produce topographies commensurable with the BCP domain spacing. The chemistry of the POSS was tuned to control the alignment and orientation of the BCP films. The substrates were used to direct the microphase separation (following toluene solvent annealing) of a hexagonal structure forming polystyrene-block-polydimethylsiloxane (PS-b-PDMS) having a domain spacing of 42.6nm and PDMS cylinder widths of 23.7nm. On more hydrophilic POSS substrates the cylinders were obtained parallel to the substrate plane and aligned with the topography. In contrast, in more hydrophobic POSS patterns, the cylinders align perpendicular to the substrate plane. The use of these methods for the nanofabrication of vias, nanofluidic devices or interconnect structures of sub-25nm feature size is discussed.
Original languageEnglish
JournalEuropean Polymer Journal
Volume49
Issue number11
Pages (from-to)3512-3521
ISSN0014-3057
DOIs
Publication statusPublished - 2013
Externally publishedYes

Keywords

  • Directed self-assembly
  • Block copolymer
  • Polyhedral oligomeric silsesquioxanes
  • Nanoimprint lithography
  • Graphoepitaxy
  • Surface chemistry

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