Soft Graphoepitaxy for Large Area Directed Self-Assembly of Polystyrene-block-Poly(dimethylsiloxane) Block Copolymer on Nanopatterned POSS Substrates Fabricated by Nanoimprint Lithography

Dipu Borah; Sozaraj Rasappa; Mathieu  Salaun; Marc Zellsmann; Olivier Lorret; George Liontos; Konstantinos  Ntetsikas; Apostolos  Avgeropoulos; Michael A. Morris

doi:10.1002/adfm.201500100

Soft Graphoepitaxy for Large Area Directed Self-Assembly of Polystyrene-block-Poly(dimethylsiloxane) Block Copolymer on Nanopatterned POSS Substrates Fabricated by Nanoimprint Lithography

Dipu Borah, Sozaraj Rasappa, Mathieu Salaun, Marc Zellsmann, Olivier Lorret, George Liontos, Konstantinos Ntetsikas, Apostolos Avgeropoulos, Michael A. Morris

Research output: Contribution to journal › Journal article › Research › peer-review

Original language	English
Journal	Advanced Functional Materials
ISSN	1616-301X
DOIs	https://doi.org/10.1002/adfm.201500100
Publication status	Published - 2015
Externally published	Yes

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Borah, D., Rasappa, S., Salaun, M., Zellsmann, M., Lorret, O., Liontos, G., Ntetsikas, K., Avgeropoulos, A., & Morris, M. A. (2015). Soft Graphoepitaxy for Large Area Directed Self-Assembly of Polystyrene-block-Poly(dimethylsiloxane) Block Copolymer on Nanopatterned POSS Substrates Fabricated by Nanoimprint Lithography. Advanced Functional Materials. https://doi.org/10.1002/adfm.201500100

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title = "Soft Graphoepitaxy for Large Area Directed Self-Assembly of Polystyrene-block-Poly(dimethylsiloxane) Block Copolymer on Nanopatterned POSS Substrates Fabricated by Nanoimprint Lithography",

author = "Dipu Borah and Sozaraj Rasappa and Mathieu Salaun and Marc Zellsmann and Olivier Lorret and George Liontos and Konstantinos Ntetsikas and Apostolos Avgeropoulos and Morris, {Michael A.}",

year = "2015",

doi = "10.1002/adfm.201500100",

language = "English",

journal = "Advanced Functional Materials",

issn = "1616-301X",

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Borah, D, Rasappa, S, Salaun, M, Zellsmann, M, Lorret, O, Liontos, G, Ntetsikas, K, Avgeropoulos, A & Morris, MA 2015, 'Soft Graphoepitaxy for Large Area Directed Self-Assembly of Polystyrene-block-Poly(dimethylsiloxane) Block Copolymer on Nanopatterned POSS Substrates Fabricated by Nanoimprint Lithography', Advanced Functional Materials. https://doi.org/10.1002/adfm.201500100

Soft Graphoepitaxy for Large Area Directed Self-Assembly of Polystyrene-block-Poly(dimethylsiloxane) Block Copolymer on Nanopatterned POSS Substrates Fabricated by Nanoimprint Lithography. / Borah, Dipu; Rasappa, Sozaraj; Salaun, Mathieu et al.
In: Advanced Functional Materials, 2015.

Research output: Contribution to journal › Journal article › Research › peer-review

TY - JOUR

T1 - Soft Graphoepitaxy for Large Area Directed Self-Assembly of Polystyrene-block-Poly(dimethylsiloxane) Block Copolymer on Nanopatterned POSS Substrates Fabricated by Nanoimprint Lithography

AU - Borah, Dipu

AU - Rasappa, Sozaraj

AU - Salaun, Mathieu

AU - Zellsmann, Marc

AU - Lorret, Olivier

AU - Liontos, George

AU - Ntetsikas, Konstantinos

AU - Avgeropoulos, Apostolos

AU - Morris, Michael A.

PY - 2015

Y1 - 2015

U2 - 10.1002/adfm.201500100

DO - 10.1002/adfm.201500100

M3 - Journal article

SN - 1616-301X

JO - Advanced Functional Materials

JF - Advanced Functional Materials

ER -