Silicon etching by negative ions in ICP and DC discharges produced in Ar/SF6

Mihai Draghici (Invited author), Eugen Stamate (Invited author)

Research output: Chapter in Book/Report/Conference proceeding › Conference abstract in proceedings › Research

Original language	English
Title of host publication	Book of abstracts
Publication date	2009
Publication status	Published - 2009
Event	2nd International Conference on Microelectronics and Plasma Technology - Busan, Korea, Democratic People's Republic of Duration: 22 Sept 2009 → 25 Sept 2009

Conference	2nd International Conference on Microelectronics and Plasma Technology
Country/Territory	Korea, Democratic People's Republic of
City	Busan
Period	22/09/2009 → 25/09/2009

Keywords

@inbook{cc89246da9f8421286345a8b7fa4470e,

title = "Silicon etching by negative ions in ICP and DC discharges produced in Ar/SF6",

keywords = "Plasma processing, Fusion energy, Fusionsenergi, Plasmaprocessering",

author = "Mihai Draghici and Eugen Stamate",

year = "2009",

language = "English",

booktitle = "Book of abstracts",

note = "2nd International Conference on Microelectronics and Plasma Technology ; Conference date: 22-09-2009 Through 25-09-2009",

}

TY - ABST

T1 - Silicon etching by negative ions in ICP and DC discharges produced in Ar/SF6

AU - Draghici, Mihai

AU - Stamate, Eugen

PY - 2009

Y1 - 2009

KW - Plasma processing

KW - Fusion energy

KW - Fusionsenergi

KW - Plasmaprocessering

M3 - Conference abstract in proceedings

BT - Book of abstracts

T2 - 2nd International Conference on Microelectronics and Plasma Technology

Y2 - 22 September 2009 through 25 September 2009

ER -