Secondary electron  emission yield  on poled silica  based thick  films

D. Braga; B. Poumellec; V. Cannas; G. Blaise; Yitao Ren; Martin Kristensen

doi:10.1063/1.1758315

Secondary electron emission yield on poled silica based thick films

D. Braga, B. Poumellec, V. Cannas, G. Blaise, Yitao Ren, Martin Kristensen

Université Paris-Sud

Research output: Contribution to journal › Journal article › Research › peer-review

580 Downloads (Pure)

Abstract

Studies on the distribution of the electric field produced by a thermal poling process in a layer of Ge-doped silica on silicon substrate, by using secondary electron emission yield (SEEY) measurements () are presented. Comparing 0 between poled and unpoled areas, the SEEY at the origin of electron injection, we pointed out an electric field 0.5 µm below the surface for our poling conditions and directed in the same direction as the external field applied during the poling process. Then, the dependence of on the injected dose of electrons allows us to deduce that the poling process disturbs the glass structure strongly enough for leading to a weak conductivity. It is then easy to display the poled areas. We have also pointed out an effect of the electric properties of the glass on the measurements obtained with the Electron Probe for MicroAnalysis.

Original language	English
Journal	Journal of Applied Physics
Volume	96
Issue number	1
Pages (from-to)	885-894
ISSN	0021-8979
DOIs	https://doi.org/10.1063/1.1758315
Publication status	Published - 2004

Bibliographical note

Copyright (2004) American Institute of Physics. This article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Institute of Physics.

Keywords

FUSED-SILICA
2ND-ORDER NONLINEARITY
CHARGE-DISTRIBUTION

Access to Document

10.1063/1.1758315

BragaFinal published version, 1.32 MB

http://link.aip.org/link/?JAPIAU/96/885/1

OpenUrl availability

Full text

Cite this

@article{628344f232c840cbb3c40e2145039374,

title = "Secondary electron emission yield on poled silica based thick films",

abstract = "Studies on the distribution of the electric field produced by a thermal poling process in a layer of Ge-doped silica on silicon substrate, by using secondary electron emission yield (SEEY) measurements () are presented. Comparing 0 between poled and unpoled areas, the SEEY at the origin of electron injection, we pointed out an electric field 0.5 µm below the surface for our poling conditions and directed in the same direction as the external field applied during the poling process. Then, the dependence of on the injected dose of electrons allows us to deduce that the poling process disturbs the glass structure strongly enough for leading to a weak conductivity. It is then easy to display the poled areas. We have also pointed out an effect of the electric properties of the glass on the measurements obtained with the Electron Probe for MicroAnalysis.",

keywords = "FUSED-SILICA, 2ND-ORDER NONLINEARITY, CHARGE-DISTRIBUTION",

author = "D. Braga and B. Poumellec and V. Cannas and G. Blaise and Yitao Ren and Martin Kristensen",

note = "Copyright (2004) American Institute of Physics. This article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Institute of Physics.",

year = "2004",

doi = "10.1063/1.1758315",

language = "English",

volume = "96",

pages = "885--894",

journal = "Journal of Applied Physics",

issn = "0021-8979",

publisher = "American Institute of Physics",

number = "1",

}

TY - JOUR

T1 - Secondary electron emission yield on poled silica based thick films

AU - Braga, D.

AU - Poumellec, B.

AU - Cannas, V.

AU - Blaise, G.

AU - Ren, Yitao

AU - Kristensen, Martin

N1 - Copyright (2004) American Institute of Physics. This article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Institute of Physics.

PY - 2004

Y1 - 2004

N2 - Studies on the distribution of the electric field produced by a thermal poling process in a layer of Ge-doped silica on silicon substrate, by using secondary electron emission yield (SEEY) measurements () are presented. Comparing 0 between poled and unpoled areas, the SEEY at the origin of electron injection, we pointed out an electric field 0.5 µm below the surface for our poling conditions and directed in the same direction as the external field applied during the poling process. Then, the dependence of on the injected dose of electrons allows us to deduce that the poling process disturbs the glass structure strongly enough for leading to a weak conductivity. It is then easy to display the poled areas. We have also pointed out an effect of the electric properties of the glass on the measurements obtained with the Electron Probe for MicroAnalysis.

AB - Studies on the distribution of the electric field produced by a thermal poling process in a layer of Ge-doped silica on silicon substrate, by using secondary electron emission yield (SEEY) measurements () are presented. Comparing 0 between poled and unpoled areas, the SEEY at the origin of electron injection, we pointed out an electric field 0.5 µm below the surface for our poling conditions and directed in the same direction as the external field applied during the poling process. Then, the dependence of on the injected dose of electrons allows us to deduce that the poling process disturbs the glass structure strongly enough for leading to a weak conductivity. It is then easy to display the poled areas. We have also pointed out an effect of the electric properties of the glass on the measurements obtained with the Electron Probe for MicroAnalysis.

KW - FUSED-SILICA

KW - 2ND-ORDER NONLINEARITY

KW - CHARGE-DISTRIBUTION

U2 - 10.1063/1.1758315

DO - 10.1063/1.1758315

M3 - Journal article

SN - 0021-8979

VL - 96

SP - 885

EP - 894

JO - Journal of Applied Physics

JF - Journal of Applied Physics

IS - 1

ER -