We report fabrication and measurements with two- and four-point probes with nanoscale dimensions, for high spatial resolution conductivity measurements on surfaces and thin films. By combination of conventional microfabrication and additive three-dimensional nanolithography, we have obtained electrode spacings down to 200 nm. At the tips of four silicon oxide microcantilevers, narrow carbon tips are grown in converging directions and subsequently coated with a conducting layer. The probe is placed in contact with a conducting surface, whereby the electrode resistance can be determined. The nanoelectrodes withstand considerable contact force before breaking. The probe offers a unique possibility to position the voltage sensors, as well as the source and drain electrodes in areas of nanoscale dimensions. ©2000 American Institute of Physics.